Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography

IF 26.6 1区材料科学 Q1 Engineering

Nano-Micro Letters Pub Date : 2025-04-22 DOI:10.1007/s40820-025-01737-w

Junlong Li, Yanmin Guo, Kun Wang, Wei Huang, Hao Su, Wenhao Li, Xiongtu Zhou, Yongai Zhang, Tailiang Guo, Chaoxing Wu

引用次数: 0

Abstract

Highlights

The submicron light sources are realized only by the normal UV photolithography process, enabling the realization of submicron light sources with arbitrary patterns.
A novel and efficient method for the fabrication of submicron light sources is proposed, termed shadow-assisted sidewall emission.
The submicron light source fabricated by the shadow-assisted sidewall emission exhibits strong scalability and has been proved to be applicable in optical anti-counterfeiting.

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阴影辅助侧壁发射在常规紫外光刻中实现亚微米线宽光源

亚微米光源仅通过常规UV光刻工艺实现，从而实现任意图案的亚微米光源。提出了一种制造亚微米光源的新方法——阴影辅助侧壁发射。利用阴影辅助侧壁发射制备的亚微米光源具有较强的可扩展性，在光学防伪方面具有较好的应用前景。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Nano-Micro Letters NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY

CiteScore

32.60

自引率

4.90%

发文量

981

审稿时长

1.1 months

期刊介绍： Nano-Micro Letters is a peer-reviewed, international, interdisciplinary, and open-access journal published under the SpringerOpen brand. Nano-Micro Letters focuses on the science, experiments, engineering, technologies, and applications of nano- or microscale structures and systems in various fields such as physics, chemistry, biology, material science, and pharmacy.It also explores the expanding interfaces between these fields. Nano-Micro Letters particularly emphasizes the bottom-up approach in the length scale from nano to micro. This approach is crucial for achieving industrial applications in nanotechnology, as it involves the assembly, modification, and control of nanostructures on a microscale.