Gas Sensor for Ammonia and Nitrogen Oxides Made of ALD-Grown MoS2

IF 2.2 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Rahel-Manuela Neubieser;Luca Guido Weckelmann;Marvin Michel;Michael Unruh;David Zanders;Aleksander Kostka;Anjana Devi;Anton Grabmaier
{"title":"Gas Sensor for Ammonia and Nitrogen Oxides Made of ALD-Grown MoS2","authors":"Rahel-Manuela Neubieser;Luca Guido Weckelmann;Marvin Michel;Michael Unruh;David Zanders;Aleksander Kostka;Anjana Devi;Anton Grabmaier","doi":"10.1109/LSENS.2025.3555498","DOIUrl":null,"url":null,"abstract":"Since the discovery of graphene, 2D materials are in the focus of research for new applications. With the advantages of light weight and flexibility, 2D materials, especially the famous group of transition metal dichalcogenides pave the way toward a new generation of sensing devices. A most practical fashion to realize such 2D material-based sensing devices is their implementation in transistor setups that allow photocurrent detection or chemically resistive sensing. Until now, gas sensing devices based on MoS<sub>2</sub> are still in research but not used commercially. This work presents two versions of a process for fabricating sensor elements with MoS<sub>2</sub> films as a sensitive layer. The use of a low-temperature atomic layer deposition process as deposition technology for MoS<sub>2</sub> thin films allows the fabrication of sensor elements that can easily be integrated in industrial scale. Furthermore, the developed devices are investigated regarding their performance to NO<sub>2</sub> and NH<sub>3</sub> at room temperature.","PeriodicalId":13014,"journal":{"name":"IEEE Sensors Letters","volume":"9 5","pages":"1-4"},"PeriodicalIF":2.2000,"publicationDate":"2025-03-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10945715","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Sensors Letters","FirstCategoryId":"1085","ListUrlMain":"https://ieeexplore.ieee.org/document/10945715/","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

Since the discovery of graphene, 2D materials are in the focus of research for new applications. With the advantages of light weight and flexibility, 2D materials, especially the famous group of transition metal dichalcogenides pave the way toward a new generation of sensing devices. A most practical fashion to realize such 2D material-based sensing devices is their implementation in transistor setups that allow photocurrent detection or chemically resistive sensing. Until now, gas sensing devices based on MoS2 are still in research but not used commercially. This work presents two versions of a process for fabricating sensor elements with MoS2 films as a sensitive layer. The use of a low-temperature atomic layer deposition process as deposition technology for MoS2 thin films allows the fabrication of sensor elements that can easily be integrated in industrial scale. Furthermore, the developed devices are investigated regarding their performance to NO2 and NH3 at room temperature.
由ald生长的MoS2制成的氨和氮氧化物气体传感器
自石墨烯的发现以来,二维材料成为新应用研究的焦点。二维材料,尤其是著名的过渡金属二硫族化合物,凭借其重量轻、柔韧性强的优势,为新一代传感器件的发展铺平了道路。实现这种基于二维材料的传感装置的最实用的方法是在晶体管设置中实现它们,允许光电流检测或化学电阻传感。到目前为止,基于二硫化钼的气体传感装置仍处于研究阶段,但尚未投入商业应用。这项工作提出了用MoS2薄膜作为敏感层制造传感器元件的两个版本的工艺。使用低温原子层沉积工艺作为二硫化钼薄膜的沉积技术,可以制造易于工业规模集成的传感器元件。此外,还研究了所研制的装置在常温下对NO2和NH3的处理性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Sensors Letters
IEEE Sensors Letters Engineering-Electrical and Electronic Engineering
CiteScore
3.50
自引率
7.10%
发文量
194
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