{"title":"Enhanced Damage Resistance of Mo/Si Multilayer Mirror with Carbon Barrier Layers under Intense Nanosecond EUV Irradiation","authors":"Chao Yun, Shuhui Li, Yinzhuo Hu, Xiangyue Liu, Zhanglin Hu, Danqiao Xu, Zhe Zhang, Qiushi Huang, Wenbin Li, Zhanshan Wang","doi":"10.1021/acs.nanolett.5c01457","DOIUrl":null,"url":null,"abstract":"The enhancement of damage-resistance capabilities has long been pursued for the development of multilayer mirrors in the field of extreme ultraviolet lithography. Here, single-shot damage experiments were conducted on periodic Mo/Si and Mo/C/Si/C multilayers using nanosecond 13.5 nm EUV radiation. It is revealed that the incorporation of carbon barrier layers significantly enhances the single-shot damage threshold of Mo/Si by about 46%. The crater-like and bump-like damages caused by compaction and expansion are, respectively, observed for Mo/Si and Mo/C/Si/C multilayers. According to characterization results, different damage mechanisms for these two samples have been identified, which are the diffusion reaction for the Mo/Si multilayer and the nonuniform graphitization for the Mo/C/Si/C multilayer. The nonuniform graphitization mechanism is further illustrated by molecular dynamics simulations. Based on the measured multilayer structure, the optical properties of the damaged Mo/C/Si/C multilayer were evaluated at a fluence of 2.68 J/cm<sup>2</sup> and found to be maintained at a high level.","PeriodicalId":53,"journal":{"name":"Nano Letters","volume":"37 1","pages":""},"PeriodicalIF":9.6000,"publicationDate":"2025-04-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nano Letters","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1021/acs.nanolett.5c01457","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
The enhancement of damage-resistance capabilities has long been pursued for the development of multilayer mirrors in the field of extreme ultraviolet lithography. Here, single-shot damage experiments were conducted on periodic Mo/Si and Mo/C/Si/C multilayers using nanosecond 13.5 nm EUV radiation. It is revealed that the incorporation of carbon barrier layers significantly enhances the single-shot damage threshold of Mo/Si by about 46%. The crater-like and bump-like damages caused by compaction and expansion are, respectively, observed for Mo/Si and Mo/C/Si/C multilayers. According to characterization results, different damage mechanisms for these two samples have been identified, which are the diffusion reaction for the Mo/Si multilayer and the nonuniform graphitization for the Mo/C/Si/C multilayer. The nonuniform graphitization mechanism is further illustrated by molecular dynamics simulations. Based on the measured multilayer structure, the optical properties of the damaged Mo/C/Si/C multilayer were evaluated at a fluence of 2.68 J/cm2 and found to be maintained at a high level.
期刊介绍:
Nano Letters serves as a dynamic platform for promptly disseminating original results in fundamental, applied, and emerging research across all facets of nanoscience and nanotechnology. A pivotal criterion for inclusion within Nano Letters is the convergence of at least two different areas or disciplines, ensuring a rich interdisciplinary scope. The journal is dedicated to fostering exploration in diverse areas, including:
- Experimental and theoretical findings on physical, chemical, and biological phenomena at the nanoscale
- Synthesis, characterization, and processing of organic, inorganic, polymer, and hybrid nanomaterials through physical, chemical, and biological methodologies
- Modeling and simulation of synthetic, assembly, and interaction processes
- Realization of integrated nanostructures and nano-engineered devices exhibiting advanced performance
- Applications of nanoscale materials in living and environmental systems
Nano Letters is committed to advancing and showcasing groundbreaking research that intersects various domains, fostering innovation and collaboration in the ever-evolving field of nanoscience and nanotechnology.