Buried Interface Engineering for MAPbI3 Perovskite Solar Cells by the Novel Carbon Nitride Synergistic Strategy

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Zuhong Li, Jinguo Cao, Xiaojie Yang, Duoling Cao, Yanyan Li*, Li Zhao* and Shimin Wang*, 
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Abstract

Carrier recombination, which arises from defects present at both the buried interface and throughout the bulk phase, hinders performance improvement in perovskite solar cells (PSCs). Nonetheless, the current strategies still face some pressing issues. Herein, we demonstrate a novel synergistic strategy of carbon nitride (C3N3) as a buried modified layer and a perovskite antisolvent additive to reduce energy loss resulting from nonradiative recombination. C3N3 functions serve as an interfacial modification layer that enhances electron mobility, improves interface contacts, and matches energy levels between SnO2 and perovskite. Meanwhile, C3N3 acts as an antisolvent additive in the perovskite layer, reducing defect density and modulating the energy level, which boosts both the efficiency and moisture stability of PSCs. Consequently, the target devices achieve a remarkable power conversion efficiency of 21.43%, with unencapsulated devices retaining 90% of their initial value after operating 1000 h. These integrated strategies provide a promising method for simultaneously reducing interfacial and bulk defects, with potential application in other photoelectronic devices.

Abstract Image

基于新型氮化碳协同策略的MAPbI3钙钛矿太阳能电池埋藏界面工程
载流子复合是由埋藏界面缺陷和整体相缺陷引起的,阻碍了钙钛矿太阳能电池(PSCs)性能的提高。尽管如此,当前的战略仍然面临着一些紧迫的问题。在此,我们展示了氮化碳(C3N3)作为埋藏改性层和钙钛矿抗溶剂添加剂的一种新的协同策略,以减少非辐射复合引起的能量损失。C3N3作为界面修饰层,增强了SnO2和钙钛矿之间的电子迁移率,改善了界面接触,并匹配了两者之间的能级。同时,C3N3作为钙钛矿层的抗溶剂添加剂,降低了缺陷密度,调节了能级,提高了聚苯乙烯复合材料的效率和水分稳定性。因此,目标器件实现了21.43%的显著功率转换效率,未封装器件在运行1000小时后仍保持其初始值的90%。这些集成策略为同时减少界面和体缺陷提供了一种有前途的方法,在其他光电子器件中具有潜在的应用前景。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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