Temperature-dependent current conduction properties and barrier inhomogeneity of Au/methylene blue (MB)/n-Ge heterostructure

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
D. Mallikarjuna, A. Ashok Kumar, V. Janardhanam, V. Rajagopal Reddy
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引用次数: 0

Abstract

The electrical properties of Au/methylene blue (MB)/n-Ge heterostructure were investigated in a wide temperature range from 125 to 400 K. The device parameters such as barrier height, ideality factor and series resistance were determined using the thermionic emission (TE) model and Cheung’s method. The barrier height (Φb) and ideality factor (n) values of the Schottky contact were determined from the current–voltage (IV) measurements and found to be 0.29 eV and 2.71 at 125 K and 0.93 eV and 1.04 at 400 K, respectively. In the presence of inhomogeneity at the metal–semiconductor contact, the barrier height was found to be decreased and the ideality factor increased with the decrease of temperature. From Cheung’s plot, the series resistance (Rs) was found to be reduced with the increase in temperature. Barrier inhomogeneity has been elucidated using the thermionic emission theory based on the assumption of Gaussian distribution of barrier heights. However, the divergence in Schottky barrier heights of Au/MB/n-Ge heterostructure evaluated from IV measurements indicates deviation from the TE theory. The conventional Richardson plot between ln(Io/T2) vs. 1000/T gives an activation energy of 0.31 eV and Richardson constant (A*) of 1.14 × 10–9 Acm−2 K−2. The modified Richardson plot evaluated by assuming the Gaussian distribution of Φb shows an enhanced activation energy of 1.15 eV and A* of 209.28 Acm−2 K−2 which is close to the theoretical value of n-Ge. Current conduction mechanisms of the Au/MB/n-Ge contact in a wide temperature range are resolved into four linear regions (Region-I to Region-IV) with different slope factors. This shows that the interfacial layer (MB) significantly influences the electrical properties of the Au/n-Ge contacts measured in a wide temperature range. The interface state density distribution over the energy below the conduction band of the n-Ge is also studied in the temperature range from 125 to 400 K.

Au/亚甲基蓝(MB)/n-Ge异质结构的电流传导特性和势垒非均匀性
研究了Au/亚甲基蓝(MB)/n-Ge异质结构在125 ~ 400 K范围内的电学性能。利用热离子发射(TE)模型和张方法确定了器件的势垒高度、理想因数和串联电阻等参数。通过电流-电压(I-V)测量确定了肖特基接触的势垒高度(Φb)和理想因子(n)值,在125 K时分别为0.29 eV和2.71,在400 K时分别为0.93 eV和1.04。在金属-半导体接触面存在非均匀性的情况下,随着温度的降低,势垒高度降低,理想系数增大。从张的图中可以看出,串联电阻(Rs)随着温度的升高而降低。基于势垒高度高斯分布的假设,利用热离子发射理论对势垒的非均匀性进行了解释。然而,Au/MB/n-Ge异质结构的肖特基势垒高度从I-V测量中得到的发散表明与TE理论存在偏差。ln(Io/T2) vs. 1000/T之间的理查德森图给出了活化能0.31 eV和理查德森常数(A*)为1.14 × 10-9 Acm−2 K−2。通过假设Φb的高斯分布对改进的理查德森图进行评估,表明活化能增强为1.15 eV, A*为209.28 Acm−2 K−2,接近n-Ge的理论值。Au/MB/n-Ge接触面在宽温度范围内的电流传导机制被分解为4个具有不同斜率因子的线性区域(区域i ~区域iv)。这表明界面层(MB)在宽温度范围内对Au/n-Ge触点的电学性能有显著影响。在125 ~ 400 K的温度范围内,研究了n-Ge导电带以下能量范围内的界面态密度分布。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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