Multilayer MoS2 Schottky Barrier Field Effect Transistor

IF 1.8 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Sebastiano De Stefano;Alfredo Spuri;Raffaele Barbella;Ofelia Durante;Adolfo Mazzotti;Andrea Sessa;Angelo Di Bernardo;Antonio Di Bartolomeo
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引用次数: 0

Abstract

The miniaturization of electronic components remains a critical focus in electronics, particularly in transistor design, with research exploring new solutions such as the use of two-dimensional materials in Schottky Barrier Field Effect Transistors (SB-FETs). Following the trend, this study presents two-dimensional MoS2 SB-FETs, configured with back-gate and van der Pauw contacts, and analyses their electrical behaviour through output and transfer characteristics. The consequences that local inhomogeneities due to fabrication processes have on Schottky barriers height and electrical behaviour of the device are underlined. A hierarchy of the Schottky barrier heights at the contacts is established, and a band model is developed to elucidate the underlying conduction mechanisms. This model combines thermionic emission and tunnelling to explain the operation of the studied MoS2 devices and can be broadly applied to other SB-FETs.
多层MoS2肖特基势垒场效应晶体管
电子元件的小型化仍然是电子学的一个关键焦点,特别是在晶体管设计方面,研究探索新的解决方案,例如在肖特基势垒场效应晶体管(sb - fet)中使用二维材料。根据这一趋势,本研究提出了具有后门和范德保触点的二维MoS2 sb - fet,并通过输出和转移特性分析了它们的电学行为。强调了由于制造工艺引起的局部不均匀性对肖特基屏障高度和器件电气行为的影响。建立了接触处肖特基势垒高度的层次结构,并建立了一个能带模型来阐明潜在的传导机制。该模型结合了热离子发射和隧道效应来解释所研究的MoS2器件的工作,可以广泛应用于其他sb - fet。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
3.90
自引率
17.60%
发文量
10
审稿时长
12 weeks
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