Nian Liu , Haoran Wang , Ling Lei , Huilong Jiang , Yongjie Zhang , Junfeng Xiao , Jianguo Zhang , Xiao Chen , Jianfeng Xu
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引用次数: 0
Abstract
Experiments and molecular dynamics (MD) simulations are combined to study the newly developed medium vacuum ultraviolet (UV)-assisted polishing (MV-UVAP) for diamond. The material removal rate (MRR) reaches over 7.0 μm/h and it is mainly determined by the diamond graphitization rate. The damage-free characteristic is confirmed by Raman and TEM measurement. MD simulation reveals the removal mechanism in MV-UVAP from an atomistic aspect. With synergic action of UV energy, O radical oxidation, and drawing force of Si-O-C bonds, lots of C atoms get removed from diamond. As large amounts of C-C bonds get rupture among this atom by atom removal process, the diamond structure is reconstructed into graphite, which is key for achieving high MRR without generating damage layers.
期刊介绍:
Tribology is the science of rubbing surfaces and contributes to every facet of our everyday life, from live cell friction to engine lubrication and seismology. As such tribology is truly multidisciplinary and this extraordinary breadth of scientific interest is reflected in the scope of Tribology International.
Tribology International seeks to publish original research papers of the highest scientific quality to provide an archival resource for scientists from all backgrounds. Written contributions are invited reporting experimental and modelling studies both in established areas of tribology and emerging fields. Scientific topics include the physics or chemistry of tribo-surfaces, bio-tribology, surface engineering and materials, contact mechanics, nano-tribology, lubricants and hydrodynamic lubrication.