RF-driven ion source for accelerator mass spectrometry with plasma modeling and validation test stand

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Sae-Hoon Park, Seung-Won Lee, Yu-Seok Kim
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引用次数: 0

Abstract

A duoplasmatron, an ion source typically used in accelerator mass spectrometry, was tested at Dongguk University, Korea, within its radiocarbon dating facility that incorporates a mini carbon dating system. The facility developed a prototype ion source for analyzing high-level 14C samples. However, the duoplasmatron exhibits limitations in terms of reliability and efficiency when used for carbon counting in gas samples. To address these limitations of duoplasmatron with plasma persistence and filament lifetime, a reliable and low-maintenance RF-driven ion source was proposed, designed and fabricated. This study focuses on plasma modeling within the RF ion source to facilitate simulation studies and predict plasma conditions. An RF ion source test stand was installed, enabling the direct injection of CO2 gas to verify the performance of RF components and confirm plasma ignition. RGA scanning revealed the elemental species generated during the plasma ignition, indicating an increase in the relative pressure intensity of the target elements. The results of the RF ion source plasma simulations and the test stand validation through a residual gas analysis, comparing the simulation and RGA scanning results are presented in this paper.
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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