Aparna A. Kulkarni, Sarika D. Shinde, Ganesh E. Patil, Pavan Hiremath, Nithesh Naik, Gotan H. Jain, Rajendra P. Patil
{"title":"Preparation of nickel oxide nanostructure by hydrothermal method as H2S gas sensor","authors":"Aparna A. Kulkarni, Sarika D. Shinde, Ganesh E. Patil, Pavan Hiremath, Nithesh Naik, Gotan H. Jain, Rajendra P. Patil","doi":"10.1007/s10854-025-14601-9","DOIUrl":null,"url":null,"abstract":"<div><p>Gas sensing is beneficial for controlling industrial and vehicle exhaust, house articles security, and environmental management. CO<sub>2</sub>, H<sub>2</sub>S, SO<sub>2</sub>, CO, H<sub>2</sub>, O<sub>2</sub>, and various gases are recognized by different tools. In the present research work, the undoped NiO nanoparticles were synthesized using a hydrothermal technique. The effect of heating time in a Teflon-lined autoclave on the structural, electrical, and gas sensing properties of NiO nanoparticles (NiO NPs) was investigated. The time taken for samples S1, S2, S3, and S4 are 12, 24, 36 and 48 h, respectively. The thick films of NiO were developed on a glass substrate using a screen-printing technique. The gas sensitivity using thick films was reported. The obtained NiO NPs were examined by X-ray diffraction (XRD), Field Emission Scanning Electron Microscopy (FESEM), and EDX. The gas response of NiO thick films was tested to recognize various air pollutants, including NO<sub>2</sub>, H<sub>2</sub>S, C<sub>2</sub>H<sub>5</sub>OH, NH<sub>3</sub>, and LPG. Among these selected gases, NiO films show the highest gas response at 250 °C for H<sub>2</sub>S to sample 4. The maximum sensitivity was recorded at 72.14% at 250 °C. The films also shows the fast response and recovery time.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":"36 10","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2025-04-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-025-14601-9","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Gas sensing is beneficial for controlling industrial and vehicle exhaust, house articles security, and environmental management. CO2, H2S, SO2, CO, H2, O2, and various gases are recognized by different tools. In the present research work, the undoped NiO nanoparticles were synthesized using a hydrothermal technique. The effect of heating time in a Teflon-lined autoclave on the structural, electrical, and gas sensing properties of NiO nanoparticles (NiO NPs) was investigated. The time taken for samples S1, S2, S3, and S4 are 12, 24, 36 and 48 h, respectively. The thick films of NiO were developed on a glass substrate using a screen-printing technique. The gas sensitivity using thick films was reported. The obtained NiO NPs were examined by X-ray diffraction (XRD), Field Emission Scanning Electron Microscopy (FESEM), and EDX. The gas response of NiO thick films was tested to recognize various air pollutants, including NO2, H2S, C2H5OH, NH3, and LPG. Among these selected gases, NiO films show the highest gas response at 250 °C for H2S to sample 4. The maximum sensitivity was recorded at 72.14% at 250 °C. The films also shows the fast response and recovery time.
期刊介绍:
The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.