Tahir Rajgoli , Suhas M. Jejurikar , Sandip Hinge , Shashikant D. Shinde
{"title":"Room-temperature near-infrared photodetection using a semi-polar n-InN/n-Si heterostructure photodetector","authors":"Tahir Rajgoli , Suhas M. Jejurikar , Sandip Hinge , Shashikant D. Shinde","doi":"10.1016/j.sna.2025.116439","DOIUrl":null,"url":null,"abstract":"<div><div>Considering the recent advancements in delivering low-cost, room-temperature operated, visible-blind infrared photodetectors for societal applications such as security and telecommunications, we demonstrate a photodetector using a semi-polar n-InN/n-Si heterostructure. We used plasma enhanced laser ablation, a novel technique, to grow semi-polar films of InN on an n-Si substrate at room temperature. Devices fabricated using this simple and resilient method demonstrated IR photodetection. The detection of IR radiation by the device is proposed to be due to enhanced photocurrent, which is caused by charge collection during the surface recombination process upon illumination with short wavelength radiations. The device properties measured using 850 nm radiation at 2 V, with the lowest lux (5000), include a photoresponsivity of 0.93, an external quantum efficiency (EQE) of 1.37, and a specific detectivity of 5.243 × 10<sup>7</sup> V/lux. The rise and decay time constants of the device are approximately 90 ms and 110 ms, respectively, clearly indicating excellent sensitivity to 850 nm radiation. The performance and the mechanism of IR wavelength detection proposed here suggest the potential use of semi-polar InN films as advanced NIR optical interconnects and power monitoring devices for next-generation detectors.</div></div>","PeriodicalId":21689,"journal":{"name":"Sensors and Actuators A-physical","volume":"389 ","pages":"Article 116439"},"PeriodicalIF":4.1000,"publicationDate":"2025-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Sensors and Actuators A-physical","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0924424725002456","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Considering the recent advancements in delivering low-cost, room-temperature operated, visible-blind infrared photodetectors for societal applications such as security and telecommunications, we demonstrate a photodetector using a semi-polar n-InN/n-Si heterostructure. We used plasma enhanced laser ablation, a novel technique, to grow semi-polar films of InN on an n-Si substrate at room temperature. Devices fabricated using this simple and resilient method demonstrated IR photodetection. The detection of IR radiation by the device is proposed to be due to enhanced photocurrent, which is caused by charge collection during the surface recombination process upon illumination with short wavelength radiations. The device properties measured using 850 nm radiation at 2 V, with the lowest lux (5000), include a photoresponsivity of 0.93, an external quantum efficiency (EQE) of 1.37, and a specific detectivity of 5.243 × 107 V/lux. The rise and decay time constants of the device are approximately 90 ms and 110 ms, respectively, clearly indicating excellent sensitivity to 850 nm radiation. The performance and the mechanism of IR wavelength detection proposed here suggest the potential use of semi-polar InN films as advanced NIR optical interconnects and power monitoring devices for next-generation detectors.
期刊介绍:
Sensors and Actuators A: Physical brings together multidisciplinary interests in one journal entirely devoted to disseminating information on all aspects of research and development of solid-state devices for transducing physical signals. Sensors and Actuators A: Physical regularly publishes original papers, letters to the Editors and from time to time invited review articles within the following device areas:
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• Mechanical sensors, such as: metallic, thin-film and semiconductor strain gauges, diffused silicon pressure sensors, silicon accelerometers, solid-state displacement transducers, piezo junction devices, piezoelectric field-effect transducers (PiFETs), tunnel-diode strain sensors, surface acoustic wave devices, silicon micromechanical switches, solid-state flow meters and electronic flow controllers.
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