{"title":"Growth of CdTe films on patterned graphene/Ge (100) by molecular beam epitaxy","authors":"Yanhui Zhang, Haitao Jiang, Zaihong Yang, Liuyan Fan, Ziteng Zhang, Can Zhou, Xiaohao Zhou, Pingping Chen","doi":"10.1063/5.0257127","DOIUrl":null,"url":null,"abstract":"Growth on patterned graphene/Ge provides a route to improve the film quality of large mismatch heteroepitaxy and simultaneously facilitate the transfer of epitaxial films; however, the growth process and its associated technical challenges remain unclear. In this work, the molecular beam epitaxy (MBE) growth of CdTe films on micro-scale patterned strip-like graphene/Ge (100), containing selective area epitaxy (SAE) of CdTe seeds on exposed Ge and the merging process of CdTe seeds, were systematically investigated. The effects of growth temperature on the SAE of CdTe seeds were studied in detail, and a growth model of the CdTe seeds was proposed. Additionally, we examined the morphology and crystal quality of CdTe films at different growth stages, identifying the suppression of CdTe nucleation on graphene during the CdTe seed growth and merging as a key challenge to obtain high-quality films on patterned graphene/Ge.","PeriodicalId":8094,"journal":{"name":"Applied Physics Letters","volume":"75 1","pages":""},"PeriodicalIF":3.5000,"publicationDate":"2025-04-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Physics Letters","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1063/5.0257127","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0
Abstract
Growth on patterned graphene/Ge provides a route to improve the film quality of large mismatch heteroepitaxy and simultaneously facilitate the transfer of epitaxial films; however, the growth process and its associated technical challenges remain unclear. In this work, the molecular beam epitaxy (MBE) growth of CdTe films on micro-scale patterned strip-like graphene/Ge (100), containing selective area epitaxy (SAE) of CdTe seeds on exposed Ge and the merging process of CdTe seeds, were systematically investigated. The effects of growth temperature on the SAE of CdTe seeds were studied in detail, and a growth model of the CdTe seeds was proposed. Additionally, we examined the morphology and crystal quality of CdTe films at different growth stages, identifying the suppression of CdTe nucleation on graphene during the CdTe seed growth and merging as a key challenge to obtain high-quality films on patterned graphene/Ge.
期刊介绍:
Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology.
In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics.
APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field.
Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.