{"title":"High-sensitive solar-blind β-Ga2O3 thin film photodetector deposited by PLD optimizing growth temperature","authors":"Mingwei Jiang , Sergii Golovynskyi , Jiating Chen, Zecheng Yang, Tengjie Lv, Guang Huang, Zhenhua Sun, Ling Li, Honglei Wu, Baikui Li","doi":"10.1016/j.vacuum.2025.114282","DOIUrl":null,"url":null,"abstract":"<div><div>Metal-semiconductor-metal photodetectors are fabricated on β-Ga<sub>2</sub>O<sub>3</sub> films grown by pulsed laser deposition at a wide range of temperatures from 400 to 650 °C. The films are β-phase with an oxygen deficiency and a bandgap of 4.65–4.84 eV. The photodetectors exhibit a narrow-band photocurrent with the main response peaked at 250 nm, which fits the solar-blind region. The epilayer deposited at 550 °C has the best crystal quality with a 4.84-eV bandgap, a responsivity of 8.5 A/W, a low dark current of 0.05 nA, an EQE of 4252 %, a detectivity of 9.5 × 10<sup>11</sup> Jones, and a slow kinetics of 0.2 s at room temperature. The photodetectors also possess a sublinear dependence of photoresponse upon illumination intensity, so the sensitivity lowers to 1 A/W at 26 μW/mm<sup>2</sup>. The responsivity increases with heating up to 24 A/W at 250 °C. There is also a minor defect component with the onset at 340 nm (3.66 eV), associated with the defect levels at 0.62, 0.85, 1.02 and 1.18 eV below the conduction band. The growth temperature optimization allows us to suppress this defect-related band. Moreover, a shallow defect level with an activation energy of 0.2 eV is involved in the photoresponse mechanism.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"238 ","pages":"Article 114282"},"PeriodicalIF":3.8000,"publicationDate":"2025-03-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X25002726","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Metal-semiconductor-metal photodetectors are fabricated on β-Ga2O3 films grown by pulsed laser deposition at a wide range of temperatures from 400 to 650 °C. The films are β-phase with an oxygen deficiency and a bandgap of 4.65–4.84 eV. The photodetectors exhibit a narrow-band photocurrent with the main response peaked at 250 nm, which fits the solar-blind region. The epilayer deposited at 550 °C has the best crystal quality with a 4.84-eV bandgap, a responsivity of 8.5 A/W, a low dark current of 0.05 nA, an EQE of 4252 %, a detectivity of 9.5 × 1011 Jones, and a slow kinetics of 0.2 s at room temperature. The photodetectors also possess a sublinear dependence of photoresponse upon illumination intensity, so the sensitivity lowers to 1 A/W at 26 μW/mm2. The responsivity increases with heating up to 24 A/W at 250 °C. There is also a minor defect component with the onset at 340 nm (3.66 eV), associated with the defect levels at 0.62, 0.85, 1.02 and 1.18 eV below the conduction band. The growth temperature optimization allows us to suppress this defect-related band. Moreover, a shallow defect level with an activation energy of 0.2 eV is involved in the photoresponse mechanism.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.