Research on the influence of intake structure on Local-Scrubber combustion process

Abstract

This paper addresses critical challenges in exhaust gas treatment for semiconductor processes by designing and constructing an efficient exhaust gas treatment system. An experimental platform was developed to conduct temperature tests within the combustion system, revealing the temperature distribution characteristics inside the cavity. Utilizing the experimental data, a numerical simulation methodology was established to optimize system performance. To evaluate the performance, the flow field distribution, flame shape, temperature distribution, and gas residence time in the combustion chamber were compared across three intake configurations: two pipes, three pipes, and a ring pipe. The results indicate that the flame shape produced by the annular intake structure outperforms that of the other configurations. Specifically, the effective treatment area of the three-pipe intake structure increases by approximately 8.5% compared to the two-pipe structure. In comparison, the ring intake structure further enhances the effective treatment area by about 1.9% over the three-pipe setup. In conclusion, the combined advantages of the three-pipe and ring pipe intake model are significant, providing a robust foundation for future system design and optimization. This approach helps reduce environmental pollution from semiconductor processes and advances the green development of the semiconductor manufacturing industry.