Epitaxial growth of bismuth on CaF2/Si(111): from planar films to self-organized arrays of nanostructures

IF 5.2 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Andrey Kaveev, Vladimir Fedorov, Dmitry Miniv, Alexandr Goltaev, Demid Kirilenko, Andrey Malenin, Ivan Mukhin
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引用次数: 0

Abstract

Bismuth nanostructures are quite attractive in the area of colorimetry and semiconductor nanoelectronics because of their multi-coloured luminescence and quantum confinement. In this work, detailed studies of the crystalline structure and surface morphology of bismuth nanostructures grown on a planar CaF2/Si(111) surface have been carried out. The growth was performed using molecular beam epitaxy. The different surface morphologies of Bi on CaF2 are demonstrated. With an increase in temperature from room temperature to 200°C, Bi undergoes a morphology change from planar to island-like, with a tendency to enlargement. At temperatures of 100–125°C, two types of nanowires with different geometric parameters are observed. Bi nano-island nucleation on a grooved and ridged CaF2/Si(001) surface was also studied. X-ray diffraction analysis shows an ordered multiple-domain growth character in all cases. Precise analysis of nanowire and island faceting based on a combination of scanning and transmission electron microscopy and X-ray diffraction simulations has been carried out.

铋在CaF2/Si(111)上的外延生长:从平面薄膜到纳米结构的自组织阵列
铋纳米结构由于其多色发光和量子约束等特性,在比色学和半导体纳米电子学领域具有广泛的应用前景。在这项工作中,详细研究了在平面CaF2/Si(111)表面生长的铋纳米结构的晶体结构和表面形貌。利用分子束外延进行生长。证明了铋在CaF2上的不同表面形态。从室温到200℃,随着温度的升高,铋的形貌由平面变为岛状,并有增大的趋势。在100-125℃的温度下,观察到两种不同几何参数的纳米线。在沟槽状和脊状CaF2/Si(001)表面研究了双纳米岛形核。x射线衍射分析表明,所有样品均具有有序的多畴生长特征。基于扫描电镜、透射电镜和x射线衍射模拟相结合的方法,对纳米线和岛状表面进行了精确分析。
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来源期刊
Journal of Applied Crystallography
Journal of Applied Crystallography CHEMISTRY, MULTIDISCIPLINARYCRYSTALLOGRAPH-CRYSTALLOGRAPHY
CiteScore
7.80
自引率
3.30%
发文量
178
期刊介绍: Many research topics in condensed matter research, materials science and the life sciences make use of crystallographic methods to study crystalline and non-crystalline matter with neutrons, X-rays and electrons. Articles published in the Journal of Applied Crystallography focus on these methods and their use in identifying structural and diffusion-controlled phase transformations, structure-property relationships, structural changes of defects, interfaces and surfaces, etc. Developments of instrumentation and crystallographic apparatus, theory and interpretation, numerical analysis and other related subjects are also covered. The journal is the primary place where crystallographic computer program information is published.
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