Diameter dependent synaptic behaviors of III-V nanowires for neuromorphic image denoising

Zeqi Zang, Zixu Sa, Pengsheng Li, Guangcan Wang, Mingxu Wang, Yanxue Yin, Feng Chen, Zai-xing Yang
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Abstract

Diameter is an important geometry parameter for III-V nanowires (NWs) in electronics, optoelectronics and neuromorphic computing. In this work, the electrical stability and synaptic behaviors of thin and thick GaSb NWs are studied in detailed. With the higher surface-to-volume ratio and much more Sb-O bonds on the surface, the thin NWs possess heavier surface states than thick NWs. As a result, the thin NW filed-effect-transistors (NWFETs) display worse electrical stability and more obvious synaptic behaviors. These impressive phenomena result from the surface states related carrier trapping and detrapping processes. By taking use of the thin and thick NWFETs together for neuromorphic image, the recognition accuracy can reach to 93.9 %, which is much higher than that of individual thin (92.1 %) or thick (84.4 %) NWFETs. This work offers new insight into the modulation of surface states for the coming neuromorphic computing by using the global NWFETs.

Abstract Image

III-V纳米线直径依赖性突触行为对神经形态图像去噪的影响
直径是III-V纳米线在电子学、光电子学和神经形态计算中重要的几何参数。本研究详细研究了薄层和厚层GaSb NWs的电稳定性和突触行为。由于表面体积比高,表面上有更多的Sb-O键,薄纳米钛比厚纳米钛具有更重的表面态。结果表明,超薄的nwfet具有较差的电稳定性和较明显的突触行为。这些令人印象深刻的现象是由与载流子捕获和脱陷过程相关的表面态引起的。同时使用薄、厚nwfet对神经形态图像的识别准确率可达93.9%,远高于单用薄、厚nwfet的识别准确率(92.1%)或单用厚nwfet的识别准确率(84.4%)。这项工作为利用全局nwfet对即将到来的神经形态计算的表面态调制提供了新的见解。
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