Vertically Integrated Dual-Memtransistor Enabled Reconfigurable Heterosynaptic Sensorimotor Networks and In-Memory Neuromorphic Computing

IF 15.8 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
ACS Nano Pub Date : 2025-03-28 DOI:10.1021/acsnano.5c00683
Srilagna Sahoo, Abin Varghese, Aniket Sadashiva, Mayank Goyal, Jayatika Sakhuja, Debanjan Bhowmik, Saurabh Lodha
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Abstract

Neuromorphic in-memory computing requires an area-efficient architecture for seamless and low-latency parallel processing of large volumes of data. Here, we report a compact, vertically integrated/stratified field-effect transistor (VSFET) consisting of a 2D nonferroelectric MoS2 FET channel stacked on a 2D ferroelectric In2Se3 FET channel. Electrostatic coupling between the ferroelectric and nonferroelectric semiconducting channels results in hysteretic transfer and output characteristics of both FETs. The gate-controlled MoS2 memtransistor is shown to emulate homosynaptic plasticity behavior with low nonlinearity, low epoch, and high accuracy supervised (ANN─artificial neural network) and unsupervised (SNN─spiking neural network) on-chip learning. Further, simultaneous measurements of the MoS2 and In2Se3 transistor synapses help to realize complex heterosynaptic cooperation and competition behaviors. These are shown to mimic advanced sensorimotor NN-controlled gill withdrawal reflex sensitization and habituation of a sea mollusk (Aplysia) with ultralow power consumption. Finally, we show logic reconfigurability of the VSFET to realize Boolean gates, thereby adding significant design flexibility for advanced computing technologies.

Abstract Image

神经形态内存计算需要一种面积效率高的架构,以便对大量数据进行无缝、低延迟的并行处理。在此,我们报告了一种紧凑型垂直集成/分层场效应晶体管(VSFET),它由二维非铁电 MoS2 FET 沟道和二维铁电 In2Se3 FET 沟道堆叠而成。铁电和非铁电半导体沟道之间的静电耦合导致了两个场效应晶体管的滞后传输和输出特性。研究表明,栅极控制的 MoS2 Memtransistor 可模拟同突触可塑性行为,具有低非线性、低历时和高精度的有监督(ANN─人工神经网络)和无监督(SNN─尖峰神经网络)片上学习功能。此外,同时测量 MoS2 和 In2Se3 晶体管突触有助于实现复杂的异突触合作和竞争行为。结果表明,这些行为模仿了高级感觉运动 NN 控制的海软体动物(Aplysia)鳃退缩反射敏感化和习惯化,而且功耗极低。最后,我们展示了 VSFET 实现布尔门的逻辑可重构性,从而为先进计算技术增加了显著的设计灵活性。
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来源期刊
ACS Nano
ACS Nano 工程技术-材料科学:综合
CiteScore
26.00
自引率
4.10%
发文量
1627
审稿时长
1.7 months
期刊介绍: ACS Nano, published monthly, serves as an international forum for comprehensive articles on nanoscience and nanotechnology research at the intersections of chemistry, biology, materials science, physics, and engineering. The journal fosters communication among scientists in these communities, facilitating collaboration, new research opportunities, and advancements through discoveries. ACS Nano covers synthesis, assembly, characterization, theory, and simulation of nanostructures, nanobiotechnology, nanofabrication, methods and tools for nanoscience and nanotechnology, and self- and directed-assembly. Alongside original research articles, it offers thorough reviews, perspectives on cutting-edge research, and discussions envisioning the future of nanoscience and nanotechnology.
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