Zile Wang, Bo Lai, Zhe Zhang, Chenyuan Chang, Yanqing Wu, Li Jiang, Runze Qi, Qiushi Huang, Zhong Zhang, Zhanshan Wang
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引用次数: 0
Abstract
Al/Sc multilayers are potential optical elements to be used for the extreme ultraviolet range at wavelengths longer than the Sc M2,3 absorption edge. The existing research exhibits a significant gap concerning the incorporation of a barrier layer within the Al/Sc multilayer to enhance interface quality. A series of Al/Sc, Al/Sc/Mo, Al/Mo/Sc, and Al/Mo/Sc/Mo multilayers were fabricated by the direct-current magnetron sputtering technique. Grazing incidence X-ray reflectivity, transmission electron microscopy, selected area electron diffraction, energy-dispersive X-ray spectroscopy, X-ray diffraction, and X-ray absorption spectroscopy were used to investigate the effect of Mo barrier layers on interface properties and layer microstructure of Al/Sc multilayers. The results indicate that Mo barrier layers with a thickness of approximately 0.5 nm at different interfaces perform different functions. The Mo barriers at Al-on-Sc interfaces primarily play a role in suppressing the columnar crystallization of Al layers, contributing to the smoothening of interfacial roughness. The thin Mo layers at Sc-on-Al interfaces mainly act as antidiffusion barriers, preventing the diffusion of Al atoms into Sc layers. A model of the impact of Mo barrier layers on the interface diffusion and microstructure of Al/Sc multilayers has been established.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.