{"title":"A Defect Detection Algorithm for Optoelectronic Detectors Utilizing GLV-YOLO.","authors":"Xinfang Zhao, Qinghua Lyu, Hui Zeng, Zhuoyi Ling, Zhongsheng Zhai, Hui Lyu, Saffa Riffat, Benyuan Chen, Wanting Wang","doi":"10.3390/mi16030267","DOIUrl":null,"url":null,"abstract":"<p><p>Photodetectors are indispensable in a multitude of applications, with the detection of surface defects serving as a cornerstone for their production and advancement. To meet the demands of real-time and accurate defect detection, this paper introduces an optimization algorithm based on the GLV-YOLO model tailored for photodetector defect detection in manufacturing settings. The algorithm achieves a reduction in the model complexity and parameter count by incorporating the GhostC3_MSF module. Additionally, it enhances feature extraction capabilities with the integration of the LSKNet_3 attention mechanism. Furthermore, it improves generalization performance through the utilization of the WIoU loss function, which minimizes geometric penalties. The experimental results showed that the proposed algorithm achieved 98.9% accuracy, with 2.1 million parameters and a computational cost of 7.0 GFLOPs. Compared to other methods, our approach outperforms them in both performance and efficiency, fulfilling the real-time and precise defect detection needs of photodetectors.</p>","PeriodicalId":18508,"journal":{"name":"Micromachines","volume":"16 3","pages":""},"PeriodicalIF":3.0000,"publicationDate":"2025-02-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC11946706/pdf/","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Micromachines","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.3390/mi16030267","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, ANALYTICAL","Score":null,"Total":0}
引用次数: 0
Abstract
Photodetectors are indispensable in a multitude of applications, with the detection of surface defects serving as a cornerstone for their production and advancement. To meet the demands of real-time and accurate defect detection, this paper introduces an optimization algorithm based on the GLV-YOLO model tailored for photodetector defect detection in manufacturing settings. The algorithm achieves a reduction in the model complexity and parameter count by incorporating the GhostC3_MSF module. Additionally, it enhances feature extraction capabilities with the integration of the LSKNet_3 attention mechanism. Furthermore, it improves generalization performance through the utilization of the WIoU loss function, which minimizes geometric penalties. The experimental results showed that the proposed algorithm achieved 98.9% accuracy, with 2.1 million parameters and a computational cost of 7.0 GFLOPs. Compared to other methods, our approach outperforms them in both performance and efficiency, fulfilling the real-time and precise defect detection needs of photodetectors.
期刊介绍:
Micromachines (ISSN 2072-666X) is an international, peer-reviewed open access journal which provides an advanced forum for studies related to micro-scaled machines and micromachinery. It publishes reviews, regular research papers and short communications. Our aim is to encourage scientists to publish their experimental and theoretical results in as much detail as possible. There is no restriction on the length of the papers. The full experimental details must be provided so that the results can be reproduced.