Characteristics of aluminum-doped SnO2in various positions using super-cycle ALD.

IF 2.9 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Jangho Bae, Hyeongtag Jeon
{"title":"Characteristics of aluminum-doped SnO<sub>2</sub>in various positions using super-cycle ALD.","authors":"Jangho Bae, Hyeongtag Jeon","doi":"10.1088/1361-6528/adc4ef","DOIUrl":null,"url":null,"abstract":"<p><p>Metal oxide has attracted increasing interest because of its low resistivity, high transmittance, and flexibility. Among many metal oxide materials, tin dioxide (SnO<sub>2</sub>), which has a low melting point and wide bandgap (3.6-4.0 eV), has properties suitable for applications such as transparent conductive oxides and thin film transistors. However, SnO<sub>2</sub>has high oxygen vacancies (O<sub>vac</sub>) and conductivity, reducing the on/off current ratio. To address this issue, we proposed an aluminum (Al) doping strategy using a super-cycle atomic layer deposition (ALD) process, which offers precise doping position control and uniform thickness. The effect of Al dopants used as the carrier suppressor in SnO<sub>2</sub>was studied with different doping positions to investigate their impact on reducing O<sub>vac</sub>and improving the off-current characteristics. The film properties were analyzed by AES, XRD, transmission electron microscopy, x-ray photoelectron spectroscopy, and Hall measurement, and the device property was analyzed by<i>I-V</i>measurements. The results revealed that Al doping in the middle region of the SnO<sub>2</sub>thin film led to the most significant reduction in carrier concentration (1.31 × 10<sup>20</sup>cm<sup>-3</sup>) and O<sub>vac</sub>(17.2%), thereby enhancing the SnO<sub>2</sub>film properties and off-current characteristics. These findings demonstrate that precise doping control via super-cycle ALD can effectively modulate the electrical properties of SnO<sub>2</sub>-based devices.</p>","PeriodicalId":19035,"journal":{"name":"Nanotechnology","volume":" ","pages":""},"PeriodicalIF":2.9000,"publicationDate":"2025-04-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nanotechnology","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1088/1361-6528/adc4ef","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

Metal oxide has attracted increasing interest because of its low resistivity, high transmittance, and flexibility. Among many metal oxide materials, tin dioxide (SnO2), which has a low melting point and wide bandgap (3.6-4.0 eV), has properties suitable for applications such as transparent conductive oxides and thin film transistors. However, SnO2has high oxygen vacancies (Ovac) and conductivity, reducing the on/off current ratio. To address this issue, we proposed an aluminum (Al) doping strategy using a super-cycle atomic layer deposition (ALD) process, which offers precise doping position control and uniform thickness. The effect of Al dopants used as the carrier suppressor in SnO2was studied with different doping positions to investigate their impact on reducing Ovacand improving the off-current characteristics. The film properties were analyzed by AES, XRD, transmission electron microscopy, x-ray photoelectron spectroscopy, and Hall measurement, and the device property was analyzed byI-Vmeasurements. The results revealed that Al doping in the middle region of the SnO2thin film led to the most significant reduction in carrier concentration (1.31 × 1020cm-3) and Ovac(17.2%), thereby enhancing the SnO2film properties and off-current characteristics. These findings demonstrate that precise doping control via super-cycle ALD can effectively modulate the electrical properties of SnO2-based devices.

求助全文
约1分钟内获得全文 求助全文
来源期刊
Nanotechnology
Nanotechnology 工程技术-材料科学:综合
CiteScore
7.10
自引率
5.70%
发文量
820
审稿时长
2.5 months
期刊介绍: The journal aims to publish papers at the forefront of nanoscale science and technology and especially those of an interdisciplinary nature. Here, nanotechnology is taken to include the ability to individually address, control, and modify structures, materials and devices with nanometre precision, and the synthesis of such structures into systems of micro- and macroscopic dimensions such as MEMS based devices. It encompasses the understanding of the fundamental physics, chemistry, biology and technology of nanometre-scale objects and how such objects can be used in the areas of computation, sensors, nanostructured materials and nano-biotechnology.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信