Shatha Almarri, Matthew Lloyd, Ed Darnbrough, David Armstrong
{"title":"Quantifying delamination energy in tungsten on silicon thin films through nanoindentation and nanoscratch","authors":"Shatha Almarri, Matthew Lloyd, Ed Darnbrough, David Armstrong","doi":"10.1016/j.matdes.2025.113873","DOIUrl":null,"url":null,"abstract":"<div><div>Quantifying delamination energy is crucial for the reliability and longevity of thin films. In this work, the delamination energy in tungsten-silicon thin films is investigated through nanoindentation and nanoscratching. Nanoindentation was also employed to assess the mechanical properties of the coating through the use of substrate corrections. Energy methods were used to analyse the nanoindentation load displacement curves to quantify the delamination energy. Finite element modelling was used to further improve the accuracy of the calculated delamination energy. Nanoscratching was found to be highly sensitive to the scratch parameters used, and the effect of scratch parameters on the critical load and delamination energy was investigated. It was found that the presence of fragmentation event in nanoscratching led to higher delamination energy values as compared to nanoindentation. Nanoindentation was found to output values closer to that of literature and were additionally not parameter sensitive, making it a reliable method of evaluating thin film adhesion.</div></div>","PeriodicalId":383,"journal":{"name":"Materials & Design","volume":"253 ","pages":"Article 113873"},"PeriodicalIF":7.6000,"publicationDate":"2025-03-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials & Design","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S026412752500293X","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Quantifying delamination energy is crucial for the reliability and longevity of thin films. In this work, the delamination energy in tungsten-silicon thin films is investigated through nanoindentation and nanoscratching. Nanoindentation was also employed to assess the mechanical properties of the coating through the use of substrate corrections. Energy methods were used to analyse the nanoindentation load displacement curves to quantify the delamination energy. Finite element modelling was used to further improve the accuracy of the calculated delamination energy. Nanoscratching was found to be highly sensitive to the scratch parameters used, and the effect of scratch parameters on the critical load and delamination energy was investigated. It was found that the presence of fragmentation event in nanoscratching led to higher delamination energy values as compared to nanoindentation. Nanoindentation was found to output values closer to that of literature and were additionally not parameter sensitive, making it a reliable method of evaluating thin film adhesion.
期刊介绍:
Materials and Design is a multi-disciplinary journal that publishes original research reports, review articles, and express communications. The journal focuses on studying the structure and properties of inorganic and organic materials, advancements in synthesis, processing, characterization, and testing, the design of materials and engineering systems, and their applications in technology. It aims to bring together various aspects of materials science, engineering, physics, and chemistry.
The journal explores themes ranging from materials to design and aims to reveal the connections between natural and artificial materials, as well as experiment and modeling. Manuscripts submitted to Materials and Design should contain elements of discovery and surprise, as they often contribute new insights into the architecture and function of matter.