Morphological and strain engineering of SiGe cladded channels for stacked nanowire transistors

IF 3.5 2区物理与天体物理 Q2 PHYSICS, APPLIED

Applied Physics Letters Pub Date : 2025-03-25 DOI:10.1063/5.0243463

Yanpeng Song, Guangxing Wan, Xiaomeng Liu, Junjie Li, Hailing Wang, Xinhe Wang, Kuanrong Hao, Z. Bai, Xiangsheng Wang, Zhenzhen Kong, Junfeng Li, Jun Luo, Yongkui Zhang, Huilong Zhu, Chao Zhao, Guilei Wang

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引用次数: 0

Abstract

This paper presents a comprehensive study of silicon germanium (SiGe) cladded channels for stacked nanowires (NWs), focusing on morphological control and strain engineering to enhance device performance. High-resolution transmission electron microscopy (TEM) was used to characterize the Si NWs and SiGe cladding morphology. The results demonstrate that the morphology of SiGe cladding can be controlled by adjusting the high-temperature H2 baking conditions, leading to shapes such as triangular, circular, and hexagonal. Technology computer-aided design simulations and geometric phase analysis of TEM images revealed that the maximum compressive stress of SiGe cladding is 3 GPa, corresponding to a compressive strain of 2.48%, which significantly enhances hole mobility. Electrical performance tests and simulations on p-type metal–oxide–semiconductor field-effect transistor devices with different morphologies showed excellent short-channel effect control, with a subthreshold swing (SS) of approximately 70 mV/dec and a drain-induced barrier lowering of only 40 mV/V. These findings provide valuable guidelines for fabricating high-quality SiGe channels with controlled structures, enabling the realization of high carrier mobilities in future devices.

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.