Enhanced Curie temperature in atomically thin perpendicular magnetic anisotropic oxide film through interfacial engineering

IF 3.6 2区 物理与天体物理 Q2 PHYSICS, APPLIED
Daolong Liu, Mingzhu Xue, Caihong Jia, Weifeng Zhang, Yongli Yu, Rui Wu, Xucai Kan, Jinbo Yang, Mingliang Tian, Shouguo Wang, Xuegang Chen
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Abstract

The inverse spinel oxide NiCo2O4, known for its high Curie temperature, low resistivity, and perpendicular magnetic anisotropy, is a promising candidate for the development of next-generation spintronic devices. However, reducing the thickness of the NiCo2O4 film to a few atomic layers degrades its room temperature magnetic and electrical properties, limiting its practical application. In this study, a Co3O4 buffer layer is introduced into ultrathin NiCo2O4 films, which significantly enhances the Curie temperature beyond room temperature and reduces the resistivity, while preserving the strong perpendicular magnetic anisotropy as well as the robust anomalous Hall effect. It is found that the sheet resistance dramatically decreases with the increase in Co3O4 thickness. The observed phenomena may originate from the increased occupation of Ni3+ ions at octahedral sites due to the interfacial coupling, resulting in the intrinsic linear relationship between resistivity and Curie temperature. Additionally, the scaling relation between the anomalous Hall conductivity and longitudinal conductivity highlights the complex interaction between spin-dependent impurity scattering and the band intrinsic Berry curvature. This study indicates that interfacial coupling is an effective strategy for tuning the physical properties of oxides, providing a promising avenue for the application of NiCo2O4-based materials in miniaturized spintronic devices.
通过界面工程提高原子薄垂直磁各向异性氧化膜的居里温度
反向尖晶石氧化物 NiCo2O4 因其居里温度高、电阻率低和垂直磁各向异性而闻名,是开发下一代自旋电子器件的理想候选材料。然而,将镍钴氧化物薄膜的厚度减至几个原子层会降低其室温磁性和电性,从而限制其实际应用。本研究在超薄镍钴氧化物薄膜中引入了 Co3O4 缓冲层,从而显著提高了室温以上的居里温度并降低了电阻率,同时保留了强垂直磁各向异性和稳健的反常霍尔效应。研究发现,薄片电阻随着 Co3O4 厚度的增加而急剧下降。观察到的现象可能源于由于界面耦合,八面体位点上的 Ni3+ 离子占据增加,从而导致电阻率与居里温度之间的内在线性关系。此外,反常霍尔电导率与纵向电导率之间的比例关系凸显了自旋相关杂质散射与带本征贝里曲率之间复杂的相互作用。这项研究表明,界面耦合是调整氧化物物理性质的有效策略,为基于镍钴氧化物的材料在微型自旋电子器件中的应用提供了一条前景广阔的途径。
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来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
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