Electrochemical analysis of Solvothermally synthesized MoS2 nanostructures for high performance supercapacitor

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-03-17 DOI:10.1016/j.vacuum.2025.114265

Sunil Kumar , Mamta Bulla , Sarita Sindhu , Raman Devi , Ajay Kumar Mishra , Vinay Kumar

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Abstract

This study investigates the influence of different solvents, including ethylene glycol (EG), dimethylformamide (DMF) and water, on the structure and electrochemical properties of MoS₂ synthesized via a single-step pot synthesis technique. These solvents facilitate the formation of MoS₂ nanostructures with diverse dimensions. The synthesized material was analyzed using XRD, FTIR, Raman spectroscopy, FE-SEM and BET analysis. The hierarchical microflower structure of MoS₂, with exfoliated edge-enriched nanosheets, exhibited the highest specific capacitance of 428 F g⁻¹ at 1 mV s⁻¹ and 280 F g⁻¹ at 1 A g⁻¹ when synthesized using water as a solvent, surpassing the results achieved with other solvents. The MoS₂ nanostructure-based symmetric supercapacitor achieved an energy density of 7.5 Wh kg⁻¹, a power density of 1980 W kg⁻¹ and retained ∼95 % capacitance after 1000 cycles at 2 A g⁻¹, highlighting its potential for future applications with exceptional stability and durability.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.