Photocatalytic activity of CuBi2O4/CuO heterojunction for methylene blue degradation under visible light irradiation

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Aminah Umar , Cindy Claudia , Munawar Khalil , Ridla Bakri , Hyung Bin Bae , Kim Tae-Hwan , Dewangga Oky Bagus Apriandanu
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引用次数: 0

Abstract

We successfully synthesized CuBi2O4/CuO heterojunction with various mass ratios using a simple grinding-annealing method. The synthesized materials exhibited optical band gap values around 1.70 eV, suggesting their capability to absorb visible light. CuBi2O4/CuO was synthesized using mass ratios of 1:1, 1:2, and 2:1, which are referred to as CuBi2O4/CuO I, CuBi2O4/CuO II, and CuBi2O4/CuO III, respectively. The photocatalytic efficacy of CuBi2O4/CuO was evaluated for methylene blue degradation. Among the various mass ratios of CuBi2O4/CuO that were tested, CuBi2O4/CuO II exhibited the highest photocatalytic degradation efficiency (81.1 %) when subjected to visible light within 180 min. HR-TEM analysis validated the heterojunction formation of CuBi2O4/CuO between CuBi2O4 and CuO. Utilizing an adequate quantity of CuBi2O4 and CuO at a mass ratio 1:2, produces a synergistic effect in the heterojunction system of exceptional superiority. This work examines how the CuBi2O4/CuO mass ratio affects the breakdown of organic pollutants under visible light exposure.
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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