Understanding the Integrated Adsorption and Photocatalytic Processes of Tetracycline over TiO2@UiO-66-NH2 Heterojunctions

IF 3.9 3区 工程技术 Q2 ENGINEERING, CHEMICAL
Ying Yang, Long Chen, Miao Li, Xiaoqing Qiu
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Abstract

Semiconductor photocatalysis holds great potential for removing organic contaminants in wastewater, where pollutant adsorption onto photocatalysts is crucial for effective degradation. Herein, tetracycline (TC) was selected as a model pollutant to explore the integrated adsorption and photocatalytic processes of TiO2@UiO-66-NH2 (TUON). Structural characterizations confirm the successful formation of the TUON heterojunction, with uniform nanoparticles and a homogeneous elemental dispersion. BET analysis shows a surface area of 429.1 m2 g–1, and the micromesoporous structure (pore size: 1–3 nm) facilitates TC adsorption (saturated adsorption capacity of 131.6 mg g–1 at 298.15 K). Adsorption follows the quasi-second-order model and the Langmuir isotherm. The absorption process is spontaneous, exothermic, and entropy-increasing. Under UV irradiation, TUON achieves almost complete TC removal within 60 min, with a rate constant of 0.04742 min–1, outperforming pure TiO2 (0.02004 min–1) and UiO-66-NH2 (0.00739 min–1). This study brings light to comprehend the pollutant adsorption and photodegradation mechanisms, promoting efficient photocatalysts for environmental applications.

Abstract Image

了解四环素在TiO2@UiO-66-NH2异质结上的综合吸附和光催化过程
半导体光催化在去除废水中的有机污染物方面具有巨大的潜力,而污染物在光催化剂上的吸附是有效降解废水的关键。本文选择四环素(TC)作为模型污染物,探索TiO2@UiO-66-NH2 (TUON)的综合吸附和光催化过程。结构表征证实了TUON异质结的成功形成,具有均匀的纳米颗粒和均匀的元素弥散。BET分析表明,其比表面积为429.1 m2 g-1,微介孔结构(孔径为1 ~ 3 nm)有利于吸附TC (298.15 K下饱和吸附量为131.6 mg g-1),吸附符合准二级模型和Langmuir等温线。吸收过程是自发的、放热的、熵递增的。在UV照射下,TUON在60 min内几乎完全去除TC,速率常数为0.04742 min - 1,优于纯TiO2 (0.02004 min - 1)和UiO-66-NH2 (0.00739 min - 1)。该研究有助于理解污染物的吸附和光降解机理,促进高效光催化剂在环境中的应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Industrial & Engineering Chemistry Research
Industrial & Engineering Chemistry Research 工程技术-工程:化工
CiteScore
7.40
自引率
7.10%
发文量
1467
审稿时长
2.8 months
期刊介绍: ndustrial & Engineering Chemistry, with variations in title and format, has been published since 1909 by the American Chemical Society. Industrial & Engineering Chemistry Research is a weekly publication that reports industrial and academic research in the broad fields of applied chemistry and chemical engineering with special focus on fundamentals, processes, and products.
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