In-Memory Sensing and Logic Processing in Negative Capacitance Phototransistors

IF 18.5 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
Jie Liu, Wushuang Han, Enliu Hong, Ming Deng, Ziqing Li, Limin Wu, Xiaosheng Fang
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Abstract

Nowadays, miniaturization, low power consumption and multi-scenario applications are urgent requirements for the development of the next generation of vision architecture. Eliminating the interface of image sensing, memory and digital processing units and folding the entire signal chain into one device has become a promising strategy but remains challenging. Here, a 2D fully ferroelectric-gated negative capacitance (NC) phototransistor is demonstrated to enable the integration of in-memory sensing and logic processing. Attributed to the combined action of ferroelectric NC effect and strong photogating effect, the prototype tungsten disulfide (WS2) NC phototransistor exhibits a small subthreshold swing (SS) of 41.7 mV dec−1 and high photodetectivity of 2.3 × 1013 Jones. The quick switching of conductance states illustrates that such a device is suitable for ultralow-power nonvolatile memory with high program/erase ratio (>104), long retention time (>104 s), stable cyclic endurance (>300 cycles) and ultralow programming energy (1.41 pJ/bit) and erasing energy (0.945 pJ/bit). The work demonstrates ferroelectric-optoelectronic engineering in 2D material to integrate sensing, memory, and logic all-in-one device, providing a promising implementation of vision system with low power consumption, low latency, and low system complexity.

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来源期刊
Advanced Functional Materials
Advanced Functional Materials 工程技术-材料科学:综合
CiteScore
29.50
自引率
4.20%
发文量
2086
审稿时长
2.1 months
期刊介绍: Firmly established as a top-tier materials science journal, Advanced Functional Materials reports breakthrough research in all aspects of materials science, including nanotechnology, chemistry, physics, and biology every week. Advanced Functional Materials is known for its rapid and fair peer review, quality content, and high impact, making it the first choice of the international materials science community.
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