Leveraging Dual Resistive Switching in Quasi-2D Perovskite Memristors for Integrated Non-volatile Memory, Synaptic Emulation, and Reservoir Computing.

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
ACS Applied Materials & Interfaces Pub Date : 2025-04-02 Epub Date: 2025-03-19 DOI:10.1021/acsami.4c21159
Zhenwang Luo, Weisheng Wang, Junhui Wu, Guohua Ma, Yanna Hou, Cheng Yang, Xu Wang, Fei Zheng, Zhenfu Zhao, Ziqi Zhao, Liqiang Zhu, Ziyang Hu
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引用次数: 0

Abstract

The increasing computational demands of artificial intelligence (AI) algorithms are exceeding the capabilities of conventional computing architectures, creating a strong need for novel materials and paradigms. Memristors that integrate diverse resistive switching (RS) behaviors provide a promising avenue for developing novel computing architectures. In this study, we achieve the coexistence of volatile and nonvolatile RS behaviors in quasi-2D perovskite memristor (Q-2DPM). The Q-2DPM exhibits competitive performance as a nonvolatile memory. Multiple synaptic functions have been successfully simulated on Q-2DPM, such as excitatory postsynaptic currents, paired-pulse facilitation, and long-term potentiation/depression. Furthermore, artificial neural networks using Q-2DPM synapses achieve high accuracy in MNIST image classification tasks. The Q-2DPM's inherent characteristics suitable for reservoir computing are also demonstrated through its application in a pulse-stream-based digital classification experiment, showcasing its impressive performance. The elucidation of the dual RS mechanisms within Q-2DPM provides fresh insights into memristor RS behavior and underscores the potential of achieving diverse computational units through a single device. This work paves the way for the implementation of physical neuromorphic hardware architectures and the advancement of sophisticated computational primitives, offering a significant step toward the next generation of computing technologies.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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