Solution-Processed Metal-Oxide Nanoparticles to Prevent The Sputtering Damage in Perovskite/Silicon Tandem Solar Cells

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Erica Magliano, Francesco Di Giacomo, Harshavardhan Reddy Sathy, Shirin M. Pourmotlagh, Gemma Giliberti, David Becerril Rodriguez, Giuseppe Ammirati, Paolo Mariani, Francesca Zarotti, Fabio Matteocci, Marco Luce, Iurie Usatii, Eugenia Bobeico, Marco Della Noce, Antonio Cricenti, Federica Cappelluti, Lucia V. Mercaldo*, Paola Delli Veneri and Aldo Di Carlo*, 
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引用次数: 0

Abstract

Semitransparent perovskite solar cells (ST-PSCs) for tandem applications typically use a buffer layer deposited via atomic layer deposition (ALD) to protect the cell stack from the damage induced by the sputtering of the transparent electrode. Here, we present a simple yet effective solution-processed buffer layer based on metal-oxide nanoparticles to mitigate sputter-induced damage. We exploit this strategy in a monolithic tandem integrating the optimized ST-PSC on a polished front-side/unpolished rear-side p-type silicon heterojunction (SHJ) solar cell. The intrinsic roughness on the backside significantly boosts the absorption, thus suppressing the need for a dedicated texturization step and leading to a final maximum efficiency of 25.3%. Our findings highlight the potential of solution-processed buffer layers as a practical and scalable solution to mitigate the sputtering damage, as well as the potential of silicon wafers with an unpolished rear surface for enhanced photocurrent.

溶液处理金属氧化物纳米颗粒防止钙钛矿/硅串联太阳能电池溅射损伤
用于串联应用的半透明钙钛矿太阳能电池(ST-PSCs)通常使用通过原子层沉积(ALD)沉积的缓冲层来保护电池堆免受透明电极溅射引起的损伤。在这里,我们提出了一种简单而有效的基于金属氧化物纳米颗粒的溶液处理缓冲层,以减轻溅射引起的损伤。我们将优化后的ST-PSC集成在抛光正面/未抛光背面p型硅异质结(SHJ)太阳能电池上。背面固有的粗糙度显著提高了吸收,从而抑制了对专用织构化步骤的需求,最终的最高效率为25.3%。我们的研究结果强调了溶液处理缓冲层作为一种实用且可扩展的解决方案的潜力,以减轻溅射损伤,以及具有未经抛光后表面的硅晶片增强光电流的潜力。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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