Comparative Study of Thermal Stability of Transparent Conducting ITO/Ag/ITO and IGZO/Ag/IGZO Three-Layer Structures

IF 0.5 Q4 PHYSICS, CONDENSED MATTER

Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques Pub Date : 2025-03-17 DOI:10.1134/S1027451024701805

A. Sh. Asvarov, A. K. Akhmedov, E. K. Murliev, A. E. Muslimov, V. M. Kanevsky

{"title":"Comparative Study of Thermal Stability of Transparent Conducting ITO/Ag/ITO and IGZO/Ag/IGZO Three-Layer Structures","authors":"A. Sh. Asvarov, A. K. Akhmedov, E. K. Murliev, A. E. Muslimov, V. M. Kanevsky","doi":"10.1134/S1027451024701805","DOIUrl":null,"url":null,"abstract":"Transparent conducting three-layer oxide/silver/oxide structures, in which wide-bandgap semiconductor materials ITO and IGZO were used as oxide top and bottom layers, were obtained by the rf magnetron sputtering method. Comparative studies of the morphology, microstructure, optical transmittance, and surface resistance of the obtained three-layer structures were carried out. It was shown that the IGZO/Ag/IGZO structure is characterized by higher optical transmittance in the visible spectral range (Tav = 75.7%) and lower surface resistance (Rsurf = 3.8 Ohm/sq) compared to the ITO/Ag/ITO structure (Tav = 71.6% and Rsurf = 3.9 Ohm/sq, respectively). Subsequent testing the stability of the three-layer structures to various heating modes revealed that both structures exhibit tolerance to thermal annealing at T ≤ 250°C both under vacuum and in air. Annealing of the three-layer structures in air at higher temperatures showed that the IGZO/Ag/IGZO structure retains its integrity and functionality up to T = 350°C, whereas integrity of the ITO/Ag/ITO structure is large-scale compromised at this temperature.","PeriodicalId":671,"journal":{"name":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","volume":"18 1 supplement","pages":"S10 - S15"},"PeriodicalIF":0.5000,"publicationDate":"2025-03-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques","FirstCategoryId":"1085","ListUrlMain":"https://link.springer.com/article/10.1134/S1027451024701805","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}

引用次数: 0

Abstract

Transparent conducting three-layer oxide/silver/oxide structures, in which wide-bandgap semiconductor materials ITO and IGZO were used as oxide top and bottom layers, were obtained by the rf magnetron sputtering method. Comparative studies of the morphology, microstructure, optical transmittance, and surface resistance of the obtained three-layer structures were carried out. It was shown that the IGZO/Ag/IGZO structure is characterized by higher optical transmittance in the visible spectral range (T_av = 75.7%) and lower surface resistance (R_surf = 3.8 Ohm/sq) compared to the ITO/Ag/ITO structure (T_av = 71.6% and R_surf = 3.9 Ohm/sq, respectively). Subsequent testing the stability of the three-layer structures to various heating modes revealed that both structures exhibit tolerance to thermal annealing at T ≤ 250°C both under vacuum and in air. Annealing of the three-layer structures in air at higher temperatures showed that the IGZO/Ag/IGZO structure retains its integrity and functionality up to T = 350°C, whereas integrity of the ITO/Ag/ITO structure is large-scale compromised at this temperature.

Abstract Image

查看原文本刊更多论文

采用射频磁控溅射法制备了以宽禁带半导体材料ITO和IGZO为氧化物顶层和底层的透明导电三层氧化物/银/氧化物结构。对所获得的三层结构的形貌、微观结构、透光率和表面电阻进行了比较研究。结果表明，与ITO/Ag/ITO结构（Tav = 71.6%, Rsurf = 3.9 Ohm/sq）相比，IGZO/Ag/IGZO结构具有更高的可见光透过率（Tav = 75.7%）和更低的表面电阻（Rsurf = 3.8 Ohm/sq）。随后对三层结构在不同加热模式下的稳定性进行了测试，结果表明，两种结构在真空和空气中均能耐受T≤250°C的热退火。三层结构在较高温度下的空气退火表明，IGZO/Ag/IGZO结构在T = 350℃时仍保持其完整性和功能，而ITO/Ag/ITO结构的完整性在此温度下被大规模破坏。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques PHYSICS, CONDENSED MATTER-

CiteScore

0.90

自引率

25.00%

发文量

144

审稿时长

3-8 weeks

期刊介绍： Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.