Synthesis of SiAlCO Coatings by Thermal Anodic Evaporation of Al and Decomposition of Tetraethoxysilane in an Arc Discharge with a Sectional Anode

IF 0.5 Q4 PHYSICS, CONDENSED MATTER
Y. A. Bruhanova, A. I. Menshakov, P. A. Skorynina
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引用次数: 0

Abstract

For the first time, SiAlCO polymer derived ceramic coatings were obtained by thermal anodic evaporation of aluminum in a low-pressure arc discharge vapor–gas medium Ar + O2 + Al + tetraethoxysilane (TEOS). It is shown that a gas discharge system with a sectional anode functions stably in a chemically active medium in a wide range of discharge currents and partial pressures of reactive components. Plasma spectra have been studied by optical emission spectroscopy under conditions of metal evaporation and decomposition of the organosilicon precursor TEOS. The influence of the Al vapor flow, arc discharge current and fluxes of reactive components on the intensification of the decomposition of TEOS and O2 dissociation is shown. This method provides both deep decomposition of the organosilicon precursor and a high degree of oxygen dissociation (up to 45%). Trial SiAlCO coatings with a homogeneous structure and good adhesion on a metal substrate with a thickness of 4.5–7 μm were obtained with a deposition rate of up to 5–7 μm/h, the hardness of SiAlCO coatings reached 10 GPa. The elemental composition and surface morphology of the coatings were studied using the SEM method, and the effect of deposition parameters on their chemical composition was also shown.

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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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