Effect of Annealing on the Defect Structure, Desorption Properties, and Structural-Phase State in Nanoscale Multilayer Zr/Nb Structures after Hydrogenation

IF 0.5 Q4 PHYSICS, CONDENSED MATTER
A. D. Lomygin, D. G. Krotkevich, R. S. Laptev, Zh. Wang, A. A. Sidorin, O. S. Orlov
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Abstract

The effect of annealing after hydrogenation on the defect structure, desorption properties, and structural-phase state of nanoscale multilayer Zr/Nb systems has been studied. Nanoscale multilayer structures based on Zr/Nb were fabricated using a magnetron sputtering system with an individual layer thickness of 50 nm. To analyze changes in the defect structure, one of the techniques of positron annihilation spectroscopy was used, Doppler broadening spectroscopy with a positron beam of variable energy for layer-by-layer positron implantation in Zr/Nb. The depth distribution of elements before and after hydrogenation was studied using glow discharge optical emission spectrometry. Analysis of changes in the structural-phase state was carried out using X-ray diffraction analysis. Thermal desorption spectroscopy was used to study the desorption of hydrogen from Zr/Nb, and the activation energy of hydrogen release was calculated by constructing Arrhenius plots. The forms of the Arrhenius plots differ from their usual form, which is associated with a nontypical distribution of hydrogen in Zr/Nb.

Abstract Image

退火对加氢后纳米多层Zr/Nb结构缺陷结构、解吸性能和结构相态的影响
研究了加氢后退火对纳米多层Zr/Nb体系缺陷结构、解吸性能和结构相态的影响。采用磁控溅射系统制备了基于Zr/Nb的纳米多层结构,单层厚度为50 nm。为了分析缺陷结构的变化,采用了正电子湮没光谱技术之一——变能量正电子束的多普勒展宽光谱,在Zr/Nb中逐层注入正电子。采用辉光发射光谱法研究了加氢前后元素的深度分布。利用x射线衍射分析了结构相态的变化。采用热解吸光谱法研究了Zr/Nb的解吸过程,并通过构建Arrhenius图计算了氢的释放活化能。Arrhenius图的形式不同于它们通常的形式,这与Zr/Nb中氢的非典型分布有关。
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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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