Cover Feature: Effect of UV Light Exposure Duration on the Removal of Exfoliation Agent Residues in Two-Dimensional Perovskite Nanosheets: An AFM Study (ChemPlusChem 3/2025)

IF 3 4区化学 Q2 CHEMISTRY, MULTIDISCIPLINARY

ChemPlusChem Pub Date : 2025-03-17 DOI:10.1002/cplu.202580303

Fatma Pinar Gordesli-Duatepe, Begümnur Küçükcan, Özge Sağlam

引用次数: 0

Abstract

The cover feature shows AFM detection of exfoliation agent residue removal on perovskite nanosheet-based nanofilms after UV exposure. AFM measurements, performed using a silicon probe, reveal how surface properties evolve with UV exposure duration, influencing nanosheet homogeneity and adhesion. The findings highlight the need to optimize UV exposure duration for effective residue removal while preserving surface quality. More details can be found in the Research Article by Fatma Pinar Gordesli-Duatepe, Özge Sağlam, and Begümnur Küçükcan (DOI: 10.1002/cplu.202400678).

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来源期刊

ChemPlusChem CHEMISTRY, MULTIDISCIPLINARY-

CiteScore

5.90

自引率

0.00%

发文量

200

审稿时长

1 months

期刊介绍： ChemPlusChem is a peer-reviewed, general chemistry journal that brings readers the very best in multidisciplinary research centering on chemistry. It is published on behalf of Chemistry Europe, an association of 16 European chemical societies. Fully comprehensive in its scope, ChemPlusChem publishes articles covering new results from at least two different aspects (subfields) of chemistry or one of chemistry and one of another scientific discipline (one chemistry topic plus another one, hence the title ChemPlusChem). All suitable submissions undergo balanced peer review by experts in the field to ensure the highest quality, originality, relevance, significance, and validity.