Crystal-face dependent neutralization in grazing scattering of Na+ ions on Al surfaces

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-03-13 DOI:10.1016/j.vacuum.2025.114255

Bin Ding , Chenxi Han , Bo Jin, Xiaogang Wang, Yibin Mao, Yue Guo, Guang Zhong, Yanling Guo, Lin Chen, Ximeng Chen

引用次数: 0

Abstract

The resonant charge transfer process based on the jellium model of free electron gas is normally used to explain the neutralization of alkali-metal ions scattering on metal surfaces with low work functions. However, we find it cannot adequately account for the angle dependent neutralization of keV-energy Na⁺ ions in grazing scattering on Al(100) and Al(110) surfaces. The bell shape of the angle dependent neutralization is observed for Al(110) in contrast to the opposite shape for Al(100). In particular, Na²⁺ ions are observed at the rough Al(100) surface, which provides direct evidence of electron excitation in Na-Al collisions. The neutralization of the non-specular scattering for Na-Al systems is dominated by the combination of the resonant charge transfer and the electron promotion mechanisms.

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基于自由电子气体啫喱模型的共振电荷转移过程通常用于解释碱金属离子在低功函数金属表面的散射中和。然而，我们发现它无法充分解释 KeV 能量的 Na+ 离子在 Al(100) 和 Al(110) 表面掠过散射中与角度相关的中和现象。在 Al(110)表面观察到的随角度变化的中和作用呈钟形，而在 Al(100)表面则相反。特别是在粗糙的 Al(100) 表面观察到 Na2+ 离子，这为 NaAl 碰撞中的电子激发提供了直接证据。Na-Al体系的非镜面散射的中和是由共振电荷转移和电子促进机制共同主导的。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.