Taylor modeling and comparative research containing aspect-ratio dependent optimization of three-dimensional Hk superjunction MOSFETs

IF 1.9 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Haimeng Huang, Zhentao Xiao, Zonghao Zhang, Chenxing Wang, Hongqiang Yang
{"title":"Taylor modeling and comparative research containing aspect-ratio dependent optimization of three-dimensional Hk superjunction MOSFETs","authors":"Haimeng Huang,&nbsp;Zhentao Xiao,&nbsp;Zonghao Zhang,&nbsp;Chenxing Wang,&nbsp;Hongqiang Yang","doi":"10.1016/j.mejo.2025.106623","DOIUrl":null,"url":null,"abstract":"<div><div>A proposed optimization for high-<em>k</em> superjunction (H<span><math><mi>k</mi></math></span>-SJ) MOSFETs focuses on reducing specific ON-resistance (<em>R</em><span><math><msub><mrow></mrow><mrow><mi>on,sp</mi></mrow></msub></math></span>) in drift regions for three dimensional (3D) configurations in two cases (3DH<span><math><mi>k</mi></math></span>core and 3DH<span><math><mi>k</mi></math></span>shell) compared to 3D conventional SJ (C-SJ) and two dimensional Hk-SJ (2DH<span><math><mi>k</mi></math></span>). Under constraints of avalanche breakdown and critical depletion, the optimized <em>R</em><span><math><msub><mrow></mrow><mrow><mi>on,sp</mi></mrow></msub></math></span> and design parameters are determined. 3DH<span><math><mi>k</mi></math></span>core achieves the lowest <em>R</em><span><math><msub><mrow></mrow><mrow><mi>on,sp</mi></mrow></msub></math></span> of 12.43 m<span><math><mrow><mi>Ω</mi><mspace></mspace><msup><mrow><mi>cm</mi></mrow><mrow><mn>2</mn></mrow></msup></mrow></math></span> at 800 V breakdown voltage (BV) for small aspect ratios (AR) due to the lower breakdown electric field (<span><math><mi>E</mi></math></span>-field) and impact ionization integral value, while 3DH<span><math><mi>k</mi></math></span>shell excels 3DH<span><math><mi>k</mi></math></span>core and 2DH<span><math><mi>k</mi></math></span> with a lower <em>R</em><span><math><msub><mrow></mrow><mrow><mi>on,sp</mi></mrow></msub></math></span> of 6.395 m<span><math><mrow><mi>Ω</mi><mspace></mspace><msup><mrow><mi>cm</mi></mrow><mrow><mn>2</mn></mrow></msup></mrow></math></span> at large AR. Comparative research containing charge imbalance, temperature robustness, and switching characteristics is discussed after optimization. Taylor modeling for 3DH<span><math><mi>k</mi></math></span>shell optimization is also proposed. For further manufacturing guidance, fitting and boundary curves formulas are provided.</div></div>","PeriodicalId":49818,"journal":{"name":"Microelectronics Journal","volume":"159 ","pages":"Article 106623"},"PeriodicalIF":1.9000,"publicationDate":"2025-03-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microelectronics Journal","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1879239125000724","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

A proposed optimization for high-k superjunction (Hk-SJ) MOSFETs focuses on reducing specific ON-resistance (Ron,sp) in drift regions for three dimensional (3D) configurations in two cases (3DHkcore and 3DHkshell) compared to 3D conventional SJ (C-SJ) and two dimensional Hk-SJ (2DHk). Under constraints of avalanche breakdown and critical depletion, the optimized Ron,sp and design parameters are determined. 3DHkcore achieves the lowest Ron,sp of 12.43 mΩcm2 at 800 V breakdown voltage (BV) for small aspect ratios (AR) due to the lower breakdown electric field (E-field) and impact ionization integral value, while 3DHkshell excels 3DHkcore and 2DHk with a lower Ron,sp of 6.395 mΩcm2 at large AR. Comparative research containing charge imbalance, temperature robustness, and switching characteristics is discussed after optimization. Taylor modeling for 3DHkshell optimization is also proposed. For further manufacturing guidance, fitting and boundary curves formulas are provided.
求助全文
约1分钟内获得全文 求助全文
来源期刊
Microelectronics Journal
Microelectronics Journal 工程技术-工程:电子与电气
CiteScore
4.00
自引率
27.30%
发文量
222
审稿时长
43 days
期刊介绍: Published since 1969, the Microelectronics Journal is an international forum for the dissemination of research and applications of microelectronic systems, circuits, and emerging technologies. Papers published in the Microelectronics Journal have undergone peer review to ensure originality, relevance, and timeliness. The journal thus provides a worldwide, regular, and comprehensive update on microelectronic circuits and systems. The Microelectronics Journal invites papers describing significant research and applications in all of the areas listed below. Comprehensive review/survey papers covering recent developments will also be considered. The Microelectronics Journal covers circuits and systems. This topic includes but is not limited to: Analog, digital, mixed, and RF circuits and related design methodologies; Logic, architectural, and system level synthesis; Testing, design for testability, built-in self-test; Area, power, and thermal analysis and design; Mixed-domain simulation and design; Embedded systems; Non-von Neumann computing and related technologies and circuits; Design and test of high complexity systems integration; SoC, NoC, SIP, and NIP design and test; 3-D integration design and analysis; Emerging device technologies and circuits, such as FinFETs, SETs, spintronics, SFQ, MTJ, etc. Application aspects such as signal and image processing including circuits for cryptography, sensors, and actuators including sensor networks, reliability and quality issues, and economic models are also welcome.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信