Enhancing the piezoelectric performance of nitride thin films through interfacial engineering

IF 21.1 1区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Kenji Hirata , Kodai Niitsu , Sri Ayu Anggraini , Taisuke Kageura , Masato Uehara , Hiroshi Yamada , Morito Akiyama
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引用次数: 0

Abstract

Scandium-doped aluminum nitride (ScAlN) with a wurtzite crystal structure exhibits piezoelectricity and ferroelectricity, and its application potential in micro-electromechanical devices is actively being investigated. One strategy to improve the piezoelectric/ferroelectric properties is to extend the solubility of Sc in wurtzite-type ScAlN. Herein, we demonstrated that introducing a lutetium (Lu) buffer layer with a hexagonal close-packed structure improved the crystallinity and c-axis orientation in wurtzite-type ScxAl1-xN thin films containing x = 0.508. The stabilization of the wurtzite phase was attributed to the epitaxial strain caused by the lattice matching between the Lu buffer layer and the ScAlN layer, resulting in an unprecedented piezoelectric constant of 35.5 pC/N, surpassing the previous 31.6 pC/N for x = 0.410. This value is an extension of the Sc concentration dependence predicted by first-principles calculations, suggesting that supersaturated Sc doping caused further elastic softening. Our results highlight interfacial engineering with lattice-compatible buffer layers as a straightforward and effective strategy to unlock the piezoelectric performance of ScAlN.

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来源期刊
Materials Today
Materials Today 工程技术-材料科学:综合
CiteScore
36.30
自引率
1.20%
发文量
237
审稿时长
23 days
期刊介绍: Materials Today is the leading journal in the Materials Today family, focusing on the latest and most impactful work in the materials science community. With a reputation for excellence in news and reviews, the journal has now expanded its coverage to include original research and aims to be at the forefront of the field. We welcome comprehensive articles, short communications, and review articles from established leaders in the rapidly evolving fields of materials science and related disciplines. We strive to provide authors with rigorous peer review, fast publication, and maximum exposure for their work. While we only accept the most significant manuscripts, our speedy evaluation process ensures that there are no unnecessary publication delays.
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