Surface state of NiOOH under oxidative conditions: Can dopants induce surface oxidation?

IF 5.6 3区 材料科学 Q1 ELECTROCHEMISTRY
Laureline Treps , Tony Ermacora , Andrea Giacomelli, Carine Michel, Stephan N. Steinmann
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引用次数: 0

Abstract

Nickel oxyhydroxide (NiOOH), featuring redox-active
, is one of the best non-noble electro-oxidation catalyst in alkaline solution. However, NiOOH is only stable at potentials 1.5 V vs RHE, with
being the stable reduced form at lower potentials. The potential of the phase transition from inactive
to active NiOOH can be tuned by substitutional doping. Lowering the potential for reaching the phase transition is thought to be beneficial for lowering the overpotential of oxidation reactions catalyzed by NiOOH. Here, we investigate which first row transition metals are most plausible for this purpose: first, the doped structure should be more stable than the phase-segregated system and second the potential for reaching the NiOOH-like phase should be lower compared to the pure Ni compound. Energy differences between pure and doped bulk structures reveal that substitutional doping of NiOOH is plausible (less than 0.5 eV difference) for many dopants, but only V can be incorporated exothermically compared to their pure oxyhydroxides. Furthermore, dopants lead to a substantial lowering in the potential necessary to reach the phase transition. Since catalysis is more a surface than a bulk process, we then investigate the surface state of NiOOH(0001) and the impact of substitutional doping on it. To address this question, we apply grand-canonical density functional theory (GC-DFT) in order to explicitly account for the electrochemical potential. We find that the stoichiometric surface (50% hydrogen coverage) is the most stable one over a large range of relevant potentials at pH 14. Surface oxidation lowers the hydrogen coverage and occurs at about 1.7 V vs RHE, i.e., 0.2 V less positive compared to the potential of the phase transition. At a substitutional doping level of 25%, only V and Cr stabilize
at significantly lower potentials compared to pure NiOOH (down to 1.1 V vs RHE) in the bulk. Furthermore, vanadium, chromium and manganese might be suitable choices as these metal centers, which remain in the +III or +IV state at lower potentials compared to Ni, could also be active sites in electro-oxidation reactions.
氧化条件下NiOOH的表面状态:掺杂剂能诱导表面氧化吗?
氢氧镍(NiOOH)具有氧化还原活性,是碱性溶液中最好的非贵金属电氧化催化剂之一。而NiOOH仅在≥1.5 V vs RHE电位下稳定,在较低电位下为稳定的还原形态。由非活性NiOOH到活性NiOOH的相变电位可以通过取代掺杂来调节。降低达到相变的电位被认为有利于降低NiOOH催化氧化反应的过电位。在这里,我们研究了哪些第一排过渡金属最可能达到这一目的:首先,掺杂结构应该比相分离体系更稳定,其次,与纯Ni化合物相比,达到nioh -like相的可能性应该更低。纯体结构和掺杂体结构之间的能量差异表明,NiOOH的取代掺杂对于许多掺杂剂来说是可行的(小于0.5 eV的差异),但与纯氢氧化物相比,只有V可以放热掺入。此外,掺杂剂导致达到相变所需的电势大幅降低。由于催化更像是一个表面过程,而不是一个整体过程,我们随后研究了NiOOH的表面状态以及取代掺杂对它的影响。为了解决这个问题,我们应用了大正则密度泛函理论(GC-DFT)来明确地解释电化学势。我们发现,在pH值为14的大范围相关电位下,化学计量表面(50%氢覆盖率)是最稳定的。表面氧化降低了氢的覆盖率,发生在约1.7 V vs RHE下,即与相变电位相比,正极降低了~ ~ 0.2 V。在25%的取代掺杂水平下,与纯NiOOH相比,只有V和Cr稳定在明显较低的电势下(低于1.1 V vs RHE)。此外,钒、铬和锰可能是合适的选择,因为这些金属中心保持在+III或+IV状态,与Ni相比电位更低,也可能是电氧化反应的活性位点。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Electrochimica Acta
Electrochimica Acta 工程技术-电化学
CiteScore
11.30
自引率
6.10%
发文量
1634
审稿时长
41 days
期刊介绍: Electrochimica Acta is an international journal. It is intended for the publication of both original work and reviews in the field of electrochemistry. Electrochemistry should be interpreted to mean any of the research fields covered by the Divisions of the International Society of Electrochemistry listed below, as well as emerging scientific domains covered by ISE New Topics Committee.
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