Compact hybrid waveguide optical switch with low loss and high extinction ratio based on Ge2Sb2Te5

IF 2.5 3区 物理与天体物理 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Tong Jiang , Qipeng Zhan , Hao Ding , Zhixiang Huang , Li Ding
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引用次数: 0

Abstract

High-efficiency and highly integrated optical switches in integrated photonic circuits have long been a pursuit for researchers. Due to the inherent limitations of silicon materials and fabrication processes, commonly used resonant or interferometric optical switches typically require tens to hundreds of micrometers of footprint to achieve desirable modulation efficiency. In response, we propose an optical switch structure filled with phase-change material (PCM) in a narrow slit, with tapered waveguides on curved sides coupling light in and out of the slit, enabling strong light-matter interaction. This structure consists of curved-side tapered coupling waveguides at both ends and a slit filled with GST (Ge2Sb2Te5) in the middle. By applying an external stimulus to induce a phase change in the GST, which exhibits significant differences in optical properties between its crystalline and amorphous states, substantial modulation efficiency can be achieved. Operating in the transverse electric mode within the band of 1500–1600 nm, this structure can achieve an extinction ratio (ER) of 34.08 dB and an insertion loss (IL) of 0.18 dB at 1550 nm, and this design can still achieve an ER over 27.26 dB and an IL less than 0.43 dB within a wavelength range of ± 50 nm, with an overall length of just 10 micrometers. The proposed structure offers high modulation efficiency and a low footprint, while also exhibiting high tolerance to fabrication errors, making it highly promising for future photonic communication systems.
基于Ge2Sb2Te5的小型低损耗高消光比混合波导光开关
集成光子电路中高效、高集成度的光开关一直是研究人员所追求的目标。由于硅材料和制造工艺的固有限制,常用的谐振式或干涉式光开关通常需要数十到数百微米的足迹才能达到理想的调制效率。为此,我们提出了一种在窄狭缝中填充相变材料(PCM)的光开关结构,弯曲侧的锥形波导耦合光进出狭缝,实现强光-物质相互作用。该结构由两端弯曲的锥形耦合波导和中间填充GST (Ge2Sb2Te5)的狭缝组成。通过施加外部刺激来诱导GST的相变,GST在其晶体和非晶态之间表现出显着的光学特性差异,可以获得可观的调制效率。该结构工作在1500-1600 nm波段的横向电模式下,在1550 nm处的消光比(ER)为34.08 dB,插入损耗(IL)为0.18 dB,在± 50 nm波长范围内,该结构的总长度仅为10微米,仍然可以实现超过27.26 dB的ER和小于0.43 dB的IL。所提出的结构具有高调制效率和低占地面积,同时也表现出对制造误差的高容忍度,使其在未来的光子通信系统中具有很高的前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
5.00
自引率
3.70%
发文量
77
审稿时长
62 days
期刊介绍: This journal establishes a dedicated channel for physicists, material scientists, chemists, engineers and computer scientists who are interested in photonics and nanostructures, and especially in research related to photonic crystals, photonic band gaps and metamaterials. The Journal sheds light on the latest developments in this growing field of science that will see the emergence of faster telecommunications and ultimately computers that use light instead of electrons to connect components.
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