Yttrium Doping Effects on the Resistive Random Access Memory Characteristics of Sputtered HfOx Films and Mechanism Investigations

IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC
Kuanlin Yeh, Poan Shih, Kailing Hsu, Weichueh Cheng and Shengyuan Chu*, 
{"title":"Yttrium Doping Effects on the Resistive Random Access Memory Characteristics of Sputtered HfOx Films and Mechanism Investigations","authors":"Kuanlin Yeh,&nbsp;Poan Shih,&nbsp;Kailing Hsu,&nbsp;Weichueh Cheng and Shengyuan Chu*,&nbsp;","doi":"10.1021/acsaelm.4c0180110.1021/acsaelm.4c01801","DOIUrl":null,"url":null,"abstract":"<p >HfO<sub><i>x</i></sub>-based resistive random-access memory (RRAM) has become a widely studied memory technology due to its simple structure and compatibility with CMOS technology. However, HfO<sub><i>x</i></sub>-based RRAM exhibits poor performance in terms of endurance and on/off ratio (<i>Appl. Phys. Lett.</i> 2024, <i>124</i>, 203503; <i>J. Mater. Chem. C</i> 2022, <i>10</i>, 5896–5904). In this study, the cosputtering technique was used to deposit hafnium oxide films doped with yttrium oxide, aiming to improve the RRAM characteristics of the hafnium oxide films. RRAMs were fabricated with the structure as Pt/HfYO<sub><i>x</i></sub>/TiN. From the XPS analyses, Yttrium doping helped increase the proposed films’ oxygen vacancy concentration. The device exhibits optimal characteristics at a doping concentration of 0.6% compared to undoped devices. This is evidenced by an increase in endurance from 500 to 2200 cycles, which can be attributed to the SCLC conduction, and an enhancement in the on/off ratio from 23.4 to 382.4, resulting from the rise in oxygen vacancies. In addition, the slope obtained by fitting the current conduction mechanism indicates an increase in the energy barrier between the films after doping. This explains the phenomenon of high-resistance state (HRS) in HfO<sub><i>x</i></sub> thin film to increase the on/off ratio of proposed films due to Yttrium-doping.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"7 5","pages":"1802–1811 1802–1811"},"PeriodicalIF":4.3000,"publicationDate":"2025-02-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/epdf/10.1021/acsaelm.4c01801","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Electronic Materials","FirstCategoryId":"88","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsaelm.4c01801","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

HfOx-based resistive random-access memory (RRAM) has become a widely studied memory technology due to its simple structure and compatibility with CMOS technology. However, HfOx-based RRAM exhibits poor performance in terms of endurance and on/off ratio (Appl. Phys. Lett. 2024, 124, 203503; J. Mater. Chem. C 2022, 10, 5896–5904). In this study, the cosputtering technique was used to deposit hafnium oxide films doped with yttrium oxide, aiming to improve the RRAM characteristics of the hafnium oxide films. RRAMs were fabricated with the structure as Pt/HfYOx/TiN. From the XPS analyses, Yttrium doping helped increase the proposed films’ oxygen vacancy concentration. The device exhibits optimal characteristics at a doping concentration of 0.6% compared to undoped devices. This is evidenced by an increase in endurance from 500 to 2200 cycles, which can be attributed to the SCLC conduction, and an enhancement in the on/off ratio from 23.4 to 382.4, resulting from the rise in oxygen vacancies. In addition, the slope obtained by fitting the current conduction mechanism indicates an increase in the energy barrier between the films after doping. This explains the phenomenon of high-resistance state (HRS) in HfOx thin film to increase the on/off ratio of proposed films due to Yttrium-doping.

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来源期刊
CiteScore
7.20
自引率
4.30%
发文量
567
期刊介绍: ACS Applied Electronic Materials is an interdisciplinary journal publishing original research covering all aspects of electronic materials. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrate knowledge in the areas of materials science, engineering, optics, physics, and chemistry into important applications of electronic materials. Sample research topics that span the journal's scope are inorganic, organic, ionic and polymeric materials with properties that include conducting, semiconducting, superconducting, insulating, dielectric, magnetic, optoelectronic, piezoelectric, ferroelectric and thermoelectric. Indexed/​Abstracted: Web of Science SCIE Scopus CAS INSPEC Portico
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