Jin-Hua Zhao , Bo-Yang Li , Ming-Yang Bu , Wen-Zhuo Zang , Ai-Jia Liu , Yi Zhao , Shuo Yan , Qing-Yang Yue , Yong Liu
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引用次数: 0
Abstract
The Z-cut potassium titanium phosphate single crystals were implanted with 2.4 MeV helium ions at a fluence of 2.2 × 1016 ions/cm2. The vacuum level duing ion implantation is approximately ∼10−4 Pa. The vacancy distribution was calculated using the SRIM code. Post-implantation, the samples underwent annealing at temperatures of 200 °C, 300 °C, 400 °C, and 500 °C for a duration of 1 h in an ambient atmosphere. To assess the waveguide's optical confinement capabilities, the dark mode spectra were measured using prism-coupling, while the end-face coupling method was employed to capture the near-field patterns of light propagation at a wavelength of 633 nm. The micro-Raman spectroscopy was utilized to investigate the structural properties across the entire implanted region. Additionally, combined with femtosecond ablation, the ridge waveguides with acceptable propagation loss were obtained. These results suggest that He-implanted KTP optical waveguide has prospects in appropriate optical devices for practical applications and warrant further exploration to unlock their full potential.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.