Silicon-based gallium oxide optical waveguide fabricated by MOCVD

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-03-06 DOI:10.1016/j.vacuum.2025.114221

Yu Han , Wei Chen , Teng Jiao , Han Yu , Zhao Zhang , Xin Dong , Yuantao Zhang , Baolin Zhang

引用次数: 0

Abstract

In this paper, the Ga₂O₃ films were grown on Si/SiO₂ template by MOCVD and the effects of the growth temperature on the film's properties were investigated. The films transitioned from an amorphous phase to a polycrystalline β-Ga₂O₃ phase as the growth temperature increased. The bonding state of oxygen in the films was investigated. Based on the measured optical parameters of amorphous Ga₂O₃ films and optical simulation calculation, optical waveguide structures were designed and fabricated. The characteristics of the waveguide were consistent with the design. The 2.5-μm-wide, 310-nm-high Ga₂O₃ waveguide achieved an optical loss of 12.4 dB/cm at 1550 nm using the truncation method. This study demonstrated that amorphous Ga₂O₃ films grown by the MOCVD have great potential for waveguide fabrication.

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MOCVD制备的硅基氧化镓光波导

本文采用MOCVD法在Si/SiO2模板上生长Ga2O3薄膜，研究了生长温度对薄膜性能的影响。随着生长温度的升高，膜由非晶相转变为多晶β-Ga2O3相。研究了氧在膜中的成键状态。基于实测的非晶Ga2O3薄膜光学参数和光学模拟计算，设计并制作了光波导结构。该波导的特性与设计一致。采用截断法制备的宽2.5 μm、高310 nm的Ga2O3波导在1550 nm处的光损耗为12.4 dB/cm。该研究表明，MOCVD生长的非晶Ga2O3薄膜在波导制造中具有很大的潜力。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.