Samarium-Doped Ceria Nanospheres Prepared via Solvothermal Method and the Chemical Mechanical Polishing Properties

IF 2.1 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Zhenyang Wang, Tongqing Wang, Xinchun Lu
{"title":"Samarium-Doped Ceria Nanospheres Prepared via Solvothermal Method and the Chemical Mechanical Polishing Properties","authors":"Zhenyang Wang,&nbsp;Tongqing Wang,&nbsp;Xinchun Lu","doi":"10.1007/s13391-024-00537-5","DOIUrl":null,"url":null,"abstract":"<div><p>As a crucial abrasive in chemical mechanical polishing (CMP), ceria has garnered significant attention regarding its preparation method and surface modification methods. This research investigates the properties for samarium-doped ceria nanospheres prepared via the solvothermal method and their CMP performance on dielectric materials. Ceria nanospheres with various Sm doping concentrations were synthesized using a surfactant-assisted solvothermal method. Doping increased the ratio of Ce<sup>3+</sup> to Ce<sup>4+</sup> and oxygen vacancy in ceria. While, Sm doping reduced the overall amount of Ce, resulting in a decrease in the material removal rate (MRR) of silicon oxide, and an initial decrease followed by an increase in the MRR of silicon nitride. The Ce<sub>0.95</sub>Sm<sub>0.05</sub>O<sub>2</sub> suspension exhibited better material removal selectivity than pristine ceria nanospheres, with an increase in the selection ratio from 7:1 to 25:1.</p><h3>Graphical Abstract</h3>\n<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 2","pages":"252 - 259"},"PeriodicalIF":2.1000,"publicationDate":"2024-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electronic Materials Letters","FirstCategoryId":"88","ListUrlMain":"https://link.springer.com/article/10.1007/s13391-024-00537-5","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

As a crucial abrasive in chemical mechanical polishing (CMP), ceria has garnered significant attention regarding its preparation method and surface modification methods. This research investigates the properties for samarium-doped ceria nanospheres prepared via the solvothermal method and their CMP performance on dielectric materials. Ceria nanospheres with various Sm doping concentrations were synthesized using a surfactant-assisted solvothermal method. Doping increased the ratio of Ce3+ to Ce4+ and oxygen vacancy in ceria. While, Sm doping reduced the overall amount of Ce, resulting in a decrease in the material removal rate (MRR) of silicon oxide, and an initial decrease followed by an increase in the MRR of silicon nitride. The Ce0.95Sm0.05O2 suspension exhibited better material removal selectivity than pristine ceria nanospheres, with an increase in the selection ratio from 7:1 to 25:1.

Graphical Abstract

溶剂热法制备掺钐铈纳米球及其化学机械抛光性能
作为化学机械抛光(CMP)中重要的磨料,二氧化铈的制备方法和表面改性方法受到了广泛的关注。研究了溶剂热法制备的掺钐铈纳米球的性能及其在介电材料上的CMP性能。采用表面活性剂辅助溶剂热法合成了不同Sm掺杂浓度的氧化铈纳米球。掺杂提高了Ce3+与Ce4+的比值,增加了氧化铈中的氧空位。而Sm掺杂降低了Ce的总量,导致氧化硅的材料去除率(MRR)下降,氮化硅的MRR先下降后上升。Ce0.95Sm0.05O2悬浮液的材料去除选择性优于原始氧化铈纳米球,选择比由7:1提高到25:1。图形抽象
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来源期刊
Electronic Materials Letters
Electronic Materials Letters 工程技术-材料科学:综合
CiteScore
4.70
自引率
20.80%
发文量
52
审稿时长
2.3 months
期刊介绍: Electronic Materials Letters is an official journal of the Korean Institute of Metals and Materials. It is a peer-reviewed international journal publishing print and online version. It covers all disciplines of research and technology in electronic materials. Emphasis is placed on science, engineering and applications of advanced materials, including electronic, magnetic, optical, organic, electrochemical, mechanical, and nanoscale materials. The aspects of synthesis and processing include thin films, nanostructures, self assembly, and bulk, all related to thermodynamics, kinetics and/or modeling.
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