Samarium-Doped Ceria Nanospheres Prepared via Solvothermal Method and the Chemical Mechanical Polishing Properties

IF 2.1 4区材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY

Electronic Materials Letters Pub Date : 2024-12-31 DOI:10.1007/s13391-024-00537-5

Zhenyang Wang, Tongqing Wang, Xinchun Lu

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Abstract

As a crucial abrasive in chemical mechanical polishing (CMP), ceria has garnered significant attention regarding its preparation method and surface modification methods. This research investigates the properties for samarium-doped ceria nanospheres prepared via the solvothermal method and their CMP performance on dielectric materials. Ceria nanospheres with various Sm doping concentrations were synthesized using a surfactant-assisted solvothermal method. Doping increased the ratio of Ce³⁺ to Ce⁴⁺ and oxygen vacancy in ceria. While, Sm doping reduced the overall amount of Ce, resulting in a decrease in the material removal rate (MRR) of silicon oxide, and an initial decrease followed by an increase in the MRR of silicon nitride. The Ce_0.95Sm_0.05O₂ suspension exhibited better material removal selectivity than pristine ceria nanospheres, with an increase in the selection ratio from 7:1 to 25:1.

Graphical Abstract

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来源期刊

Electronic Materials Letters 工程技术-材料科学：综合

CiteScore

4.70

自引率

20.80%

发文量

审稿时长

2.3 months

期刊介绍： Electronic Materials Letters is an official journal of the Korean Institute of Metals and Materials. It is a peer-reviewed international journal publishing print and online version. It covers all disciplines of research and technology in electronic materials. Emphasis is placed on science, engineering and applications of advanced materials, including electronic, magnetic, optical, organic, electrochemical, mechanical, and nanoscale materials. The aspects of synthesis and processing include thin films, nanostructures, self assembly, and bulk, all related to thermodynamics, kinetics and/or modeling.