Performance of a low-power ablative Z-pinch pulsed plasma thruster with PTFE-Cu propellant under alternative cathode configurations

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Jiqin Wang , Jiping Ding , Weizong Wang , Peixu Liu , Guangchuan Zhang , Haibin Tang
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引用次数: 0

Abstract

With a unique front-back coaxial configuration, ablative Z-pinch pulsed plasma thruster (AZPPT) possesses the advantages of a high thrust to power ratio at low power and a simple structure which make itself suitable for small and Nano satellites applications. However, the specific impulse of AZPPT is relatively low, limiting its further application expansion. Therefore, a performance study on a low-power AZPPT adopting a novel alternative propellant of PTFE impregnated with Cu was conducted. The impulse bit, ablation mass, and discharge characteristics of the thruster are obtained and compared under different conditions of Cu fractions in PTFE-Cu propellant, cathode orifice diameters and nozzle configurations. Experiments show that the specific impulse of PTFE-5%Cu is 24 % higher than that of pure PTFE. Triple Langmuir probe indicates that such improvement is caused by the effectively increased ionization rate of ablated propellant and weakened late-time ablation effect. The results also show that the cathode with larger orifice reduces the impulse bit, but increases the specific impulse and effectively reduces the plume divergence angle. Moreover, nozzle configuration hardly affects the ablation characteristics, but shows a significant influence on the impulse bit by converging the plasma plume. The specific impulse with a divergent nozzle can reach 629.5 s at the discharge energy of 5 J, which is 14.89 % higher than that without a nozzle. These detailed insights for the first time clear the influence of impregnated propellant and cathode configuration on the low-power AZPPT, providing new ideas for the performance optimization of AZPPT.
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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