Yan Zhang , Jianing Wang , Zihao Lu , Fei Yang , Yuan Yang , Jingya Wu , Yabing Sun , Zhengjie Xu , Xianwen Wang , Fang Wang
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引用次数: 0
Abstract
Halogen vacancy defects and long-chain insulating ligands within CsPbX3 (X = Cl, Br and I) quantum dots (QDs) are key factors that restrict the performance of QD light-emitting diodes (QLEDs). This paper uses benzylphosphonic acid (BPA) as an interface layer to stabilize the phase structure of CsPbBrxI3-x QDs and optimize the optoelectronic properties to achieve comprehensive improvement of QLED performance. The results showed that when CsPbBrxI3-x QD was spin-coated on the BPA layer, the phosphonate groups of BPA stabilized the intrinsic phase structure by binding with the uncoordinated Pb2+ in the QD film, passivated defects, and partially replaced the oleic acid ligands to improve the conductivity of CsPbBrxI3-x QD film. The fluorescence intensity, fluorescence lifetime and photoluminescence quantum yield (PLQY) of CsPbBrxI3-x QD film after introducing the BPA layer have been effectively improved. And the maximum brightness (Lmax) of CsPbBrxI3-x QLEDs, following BPA modification, increased from 301 cd/m2 to 675 cd/m2. Additionally, the external quantum efficiency (EQE) rose from 1.1 % to 8.0 %. This study confirms that phosphonic acid-based organic ligands can modify CsPbBrxI3-x QDs through interface passivation. Compared with traditional QD optimization methods, it is simpler and more efficient, which is helpful for the industrial production of QLEDs.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.