Development of a plasma system based on gridless ion acceleration for deposition of aluminum oxide coatings

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
I.V. Lopatin, Yu.H. Akhmadeev, N.N. Koval, E.A. Petrikova
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引用次数: 0

Abstract

An electrode scheme containing two low-temperature plasma-physical devices was developed and implemented. The gas and a metal-containing plasma generating in this system are divided. The low-temperature plasma generation in the discharge with the external electrons injection through a double electrostatic layer, without overlapping of the output emission window with a plasma-limiting grid is producing in the system. It was shown that a change in the arc current with the cathode spot does not cause significant changes in the thermionic cathode discharge operation, while the thermionic cathode discharge operation conditions and the accelerating voltage significantly affect the main characteristics of the system operation. The measured concentration of gas-metal discharge plasma with the external electrons injection may exceed 3 × 1018 m−3 in the volume of ∼ 1 × 10−3 m3. The energy and current density of ions accelerated in the developed plasma system were studied, the possibility of ion flux forming with particle energy of tens of eV and current density of up to 100 A/m2 without overlapping the emission window with a plasma-limiting grid was shown. The possibility of α-alumina containing coatings forming was demonstrated in test deposition experiments.
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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