Corrosion Inhibition Effect of 2-([(1E)-(2-hydroxyphenyl)methylene]amino) Benzoic Acid on Nickel in Sulfuric Acid: Electrochemical, Charge-Discharge and Computational Studies

IF 3.5 4区 化学 Q2 ELECTROCHEMISTRY
Hany M. Abd El-Lateef, Mai M. Khalaf, Aly Abdou, Hoda Abd El-Shafy Shilkamy
{"title":"Corrosion Inhibition Effect of 2-([(1E)-(2-hydroxyphenyl)methylene]amino) Benzoic Acid on Nickel in Sulfuric Acid: Electrochemical, Charge-Discharge and Computational Studies","authors":"Hany M. Abd El-Lateef,&nbsp;Mai M. Khalaf,&nbsp;Aly Abdou,&nbsp;Hoda Abd El-Shafy Shilkamy","doi":"10.1002/celc.202400584","DOIUrl":null,"url":null,"abstract":"<p>Ni-based alloys have excellent corrosion resistance and are widely used in the petrochemical industry. In this study, the effect of sulfuric acid on the corrosion resistance of Ni was analyzed by electrochemical tests and theoretical studies in the absence and presence of 2-([(1E)-(2-hydroxyphenyl)methylene]amino)benzoic acid (H2 L). Sulfuric acid's corrosive effect, notably in fertilizer production, poses challenges for materials like nickel used in storage and transport. Discussion of nickel corrosion which is frequently used to handle sulfuric acid is given in this paper. The corrosion behavior of nickel (Ni) metal and the inhibitory effect of 2-([(1E)-(2-hydroxyphenyl)methylene]amino)benzoic acid (H<sub>2</sub>L) were investigated using a combination of electrochemical and computational approaches. In this study, 0.5 M sulfuric acid served as the corrosive medium. The inhibitory effect of H<sub>2</sub>L was evaluated using Tafel plots and electrochemical impedance spectroscopy. Results show a gradual decrease in the corrosion current density (<i>I</i><sub>corr.</sub>) over time, accompanied by an increase in inhibition efficiency, attributed to rising additive concentrations. The maximum inhibition efficiency (<i>η</i>=97.8 %) was achieved at 1×10<sup>−5</sup> M additive concentration and 25 °C. The additive predominantly affects the anodic reaction compared to the cathodic reaction and reduces NiO formation on electrode surfaces. Increasing solution temperature enhances inhibition efficiency, indicating chemisorption following the Langmuir model, supported by electrochemical impedance spectroscopy. Scanning electron microscopy (SEM) analysis confirms that H2 L inclusion significantly enhances nickel corrosion resistance. Charge-discharge processes of Ni were studied in 0.5 M H<sub>2</sub>SO<sub>4</sub> containing various dosages of the additive at applied distinct current densities. It is interesting to note that both discharging time and specific capacitance rises with raising the applied current density at each dosage of additive in 0.5 M H<sub>2</sub>SO<sub>4</sub>. The most enhancements were obtained at presence of 1×10<sup>−5</sup> M of the additive, as corrosion resistance and specific capacitance (0.391 mAh at 90 mA cm<sup>−2</sup>). Also, improved power and energy features are obtained in the presence of this concentration of the additive. Theoretical Density Functional Theory (DFT) studies reveal that H<sub>2</sub>L possesses a low ΔE<sub>gap</sub>, facilitating chemical adsorption during the inhibition process, underlining the innovative nature of this corrosion inhibition strategy. Furthermore, the H<sub>2</sub>L−Ni interaction was effectively simulated using the DFT/B3LYP/6-311+G**, providing valuable insights into the compound's corrosion inhibition capabilities.</p>","PeriodicalId":142,"journal":{"name":"ChemElectroChem","volume":"12 5","pages":""},"PeriodicalIF":3.5000,"publicationDate":"2025-01-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/celc.202400584","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ChemElectroChem","FirstCategoryId":"92","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/celc.202400584","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ELECTROCHEMISTRY","Score":null,"Total":0}
引用次数: 0

Abstract

Ni-based alloys have excellent corrosion resistance and are widely used in the petrochemical industry. In this study, the effect of sulfuric acid on the corrosion resistance of Ni was analyzed by electrochemical tests and theoretical studies in the absence and presence of 2-([(1E)-(2-hydroxyphenyl)methylene]amino)benzoic acid (H2 L). Sulfuric acid's corrosive effect, notably in fertilizer production, poses challenges for materials like nickel used in storage and transport. Discussion of nickel corrosion which is frequently used to handle sulfuric acid is given in this paper. The corrosion behavior of nickel (Ni) metal and the inhibitory effect of 2-([(1E)-(2-hydroxyphenyl)methylene]amino)benzoic acid (H2L) were investigated using a combination of electrochemical and computational approaches. In this study, 0.5 M sulfuric acid served as the corrosive medium. The inhibitory effect of H2L was evaluated using Tafel plots and electrochemical impedance spectroscopy. Results show a gradual decrease in the corrosion current density (Icorr.) over time, accompanied by an increase in inhibition efficiency, attributed to rising additive concentrations. The maximum inhibition efficiency (η=97.8 %) was achieved at 1×10−5 M additive concentration and 25 °C. The additive predominantly affects the anodic reaction compared to the cathodic reaction and reduces NiO formation on electrode surfaces. Increasing solution temperature enhances inhibition efficiency, indicating chemisorption following the Langmuir model, supported by electrochemical impedance spectroscopy. Scanning electron microscopy (SEM) analysis confirms that H2 L inclusion significantly enhances nickel corrosion resistance. Charge-discharge processes of Ni were studied in 0.5 M H2SO4 containing various dosages of the additive at applied distinct current densities. It is interesting to note that both discharging time and specific capacitance rises with raising the applied current density at each dosage of additive in 0.5 M H2SO4. The most enhancements were obtained at presence of 1×10−5 M of the additive, as corrosion resistance and specific capacitance (0.391 mAh at 90 mA cm−2). Also, improved power and energy features are obtained in the presence of this concentration of the additive. Theoretical Density Functional Theory (DFT) studies reveal that H2L possesses a low ΔEgap, facilitating chemical adsorption during the inhibition process, underlining the innovative nature of this corrosion inhibition strategy. Furthermore, the H2L−Ni interaction was effectively simulated using the DFT/B3LYP/6-311+G**, providing valuable insights into the compound's corrosion inhibition capabilities.

Abstract Image

镍基合金具有优异的耐腐蚀性,被广泛应用于石油化工行业。本研究通过电化学试验和理论研究,分析了硫酸在没有 2-([(1E)-(2-羟基苯基)亚甲基]氨基)苯甲酸(H2 L)和有 2-([(1E)-(2-羟基苯基)亚甲基]氨基)苯甲酸(H2 L)的情况下对镍的耐腐蚀性的影响。硫酸的腐蚀作用,尤其是在化肥生产中的腐蚀作用,给用于储存和运输的镍等材料带来了挑战。本文讨论了经常用于处理硫酸的镍的腐蚀问题。本文采用电化学和计算相结合的方法研究了金属镍(Ni)的腐蚀行为和 2-([(1E)-(2-羟基苯基)亚甲基]氨基)苯甲酸(H2L)的抑制作用。本研究以 0.5 M 硫酸作为腐蚀介质。采用塔菲尔图和电化学阻抗谱评估了 H2L 的抑制作用。结果表明,随着时间的推移,腐蚀电流密度(Icorr.)在添加剂浓度为 1×10-5 M 和温度为 25 °C 时,抑制效率达到最大值(η=97.8 %)。与阴极反应相比,添加剂主要影响阳极反应,并减少电极表面氧化镍的形成。提高溶液温度可提高抑制效率,这表明化学吸附作用遵循 Langmuir 模型,并得到电化学阻抗光谱的支持。扫描电子显微镜(SEM)分析证实,H2 L 的加入显著增强了镍的耐腐蚀性。研究人员在含有不同添加剂用量的 0.5 M H2SO4 中,以不同的电流密度对镍进行了充放电处理。值得注意的是,在 0.5 M H2SO4 中,随着添加剂用量的增加,放电时间和比电容都会增加。添加剂用量为 1×10-5 M 时,耐腐蚀性和比电容(90 mA cm-2 时为 0.391 mAh)的提高幅度最大。此外,该浓度的添加剂还改善了功率和能量特性。理论密度泛函理论(DFT)研究表明,H2L 具有较低的ΔEgap,有利于在缓蚀过程中进行化学吸附,凸显了这种缓蚀策略的创新性。此外,利用 DFT/B3LYP/6-311+G** 有效模拟了 H2L-Ni 的相互作用,为了解该化合物的缓蚀能力提供了宝贵的见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
ChemElectroChem
ChemElectroChem ELECTROCHEMISTRY-
CiteScore
7.90
自引率
2.50%
发文量
515
审稿时长
1.2 months
期刊介绍: ChemElectroChem is aimed to become a top-ranking electrochemistry journal for primary research papers and critical secondary information from authors across the world. The journal covers the entire scope of pure and applied electrochemistry, the latter encompassing (among others) energy applications, electrochemistry at interfaces (including surfaces), photoelectrochemistry and bioelectrochemistry.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信