Preparation of Silica Powder from Low-Grade Quartz by Mechanical Activation Acid Leaching and Its Mechanism

IF 2.8 3区材料科学 Q3 CHEMISTRY, PHYSICAL

Silicon Pub Date : 2025-02-07 DOI:10.1007/s12633-025-03240-8

Yuziyu Gui, Xiaoxiao Zhu, Hao Fu, Xuesong Jiang, Jifei Sun, Ling Wang, Boyuan Ban, Jian Chen

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引用次数: 0

Abstract

Quartz is crucial in semiconductors and electronic packaging. Due to the depletion of high-grade quartz, there's a need to use low-grade quartz to produce high-purity products. Traditional methods use environmentally harmful hydrofluoric acid (HF). This study presents a mechanical activation fluorine-free acid leaching method (F-free MA-AL) to produce high-purity silica powder from low-grade quartz, achieving an impurity content of 154.18 ppm and a removal rate of 97.76%. Optimal conditions are 600 rpm for 90 min, increasing the quartz’s specific surface area by 6.04 times. XRD refinement and XPS tests revealed that mechanical activation modifies quartz’s crystal structure, enhances impurity activity, and facilitates acid leaching. This method avoids HF use while maintaining purification effectiveness. Kinetic studies on Al and Fe removal indicate that mechanical activation reduces activation energy by 45.27% and 17.5%, respectively. This method realizes the comprehensive utilization of low-grade quartz ore and provides a theoretical basis for the industrialization of low-grade quartz application under the premise of fluoride-free environment.

1. Investigated quartz's mechanical activation behavior.

2. Analyzed quartz's microstructure changes using XRD refinement.

3. Proposed a fluorine-free acid leaching method for impurity removal in quartz.

4. Found mechanical activation lowers activation energy in impurity removal reactions.

5. Made it possible to prepare high-purity silica powder from low-grade quartz.

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用机械活化酸浸法从低品位石英制备硅粉及其机理

石英在半导体和电子封装中至关重要。由于高品位石英的枯竭，需要使用低品位石英来生产高纯产品。传统方法使用对环境有害的氢氟酸（HF）。采用机械活化无氟酸浸法（F-free MA-AL）从低品位石英中提取高纯硅粉，杂质含量为154.18 ppm，去除率为97.76%。最佳条件是600转/分钟90分钟，增加石英的比表面积6.04倍。XRD精细化和XPS测试表明，机械活化改变了石英的晶体结构，提高了杂质活性，有利于酸浸。该方法在保持净化效果的同时避免了HF的使用。对Al和Fe去除的动力学研究表明，机械活化分别使活化能降低45.27%和17.5%。该方法实现了低品位石英矿石的综合利用，为在无氟环境前提下实现低品位石英产业化应用提供了理论依据。研究了石英的力学活化行为。利用XRD细化分析了石英的微观结构变化。提出了一种无氟酸浸除石英杂质的方法。发现机械活化降低了除杂反应的活化能。使低品位石英制备高纯度硅粉成为可能。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Silicon CHEMISTRY, PHYSICAL-MATERIALS SCIENCE, MULTIDISCIPLINARY

CiteScore

5.90

自引率

20.60%

发文量

685

审稿时长

>12 weeks

期刊介绍： The journal Silicon is intended to serve all those involved in studying the role of silicon as an enabling element in materials science. There are no restrictions on disciplinary boundaries provided the focus is on silicon-based materials or adds significantly to the understanding of such materials. Accordingly, such contributions are welcome in the areas of inorganic and organic chemistry, physics, biology, engineering, nanoscience, environmental science, electronics and optoelectronics, and modeling and theory. Relevant silicon-based materials include, but are not limited to, semiconductors, polymers, composites, ceramics, glasses, coatings, resins, composites, small molecules, and thin films.