Controlled Growth of Ultrathin Graphitic Carbon Nitride Films by Chemical Vapor Deposition

IF 9.6 1区化学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY

ACS Materials Letters Pub Date : 2025-02-06 DOI:10.1021/acsmaterialslett.4c0250710.1021/acsmaterialslett.4c02507

Lu Chen, Qiuyue Feng, Paolo Giusto, Dawei Luo, Wei Zhang*, Junjun Liu*, Markus Antonietti and Kai Xiao*,

{"title":"Controlled Growth of Ultrathin Graphitic Carbon Nitride Films by Chemical Vapor Deposition","authors":"Lu Chen, Qiuyue Feng, Paolo Giusto, Dawei Luo, Wei Zhang*, Junjun Liu*, Markus Antonietti and Kai Xiao*, ","doi":"10.1021/acsmaterialslett.4c0250710.1021/acsmaterialslett.4c02507","DOIUrl":null,"url":null,"abstract":"Efforts have been relentlessly pursued to develop high-quality and uniform graphitic carbon nitride (g-C3N4) films. In this work, a thermal chemical vapor deposition (CVD) method was developed for the synthesis of homogeneous g-C3N4 films on various substrates using melamine powder as a precursor. The film produced on a silicon wafer is ultrathin, down to 10 nm, with good crystallinity. By changing the precursor and extending the polymerization time, it is also possible to deposit a homogeneous free-standing film on top of anodic aluminum oxide (AAO). The film can be peeled off after the sample is immersed in distilled water for 10 min. Notably, upon characterization, the chemical features and composition were found to closely resemble those of the ideal g-C3N4. This research offers a method for growing g-C3N4 films, which is crucial for broadening their utility beyond catalysis and potentially paving the way for future applications in optoelectronic devices and beyond.","PeriodicalId":19,"journal":{"name":"ACS Materials Letters","volume":"7 3","pages":"869–875 869–875"},"PeriodicalIF":9.6000,"publicationDate":"2025-02-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Materials Letters","FirstCategoryId":"92","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsmaterialslett.4c02507","RegionNum":1,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}

引用次数: 0

Abstract

Efforts have been relentlessly pursued to develop high-quality and uniform graphitic carbon nitride (g-C₃N₄) films. In this work, a thermal chemical vapor deposition (CVD) method was developed for the synthesis of homogeneous g-C₃N₄ films on various substrates using melamine powder as a precursor. The film produced on a silicon wafer is ultrathin, down to 10 nm, with good crystallinity. By changing the precursor and extending the polymerization time, it is also possible to deposit a homogeneous free-standing film on top of anodic aluminum oxide (AAO). The film can be peeled off after the sample is immersed in distilled water for 10 min. Notably, upon characterization, the chemical features and composition were found to closely resemble those of the ideal g-C₃N₄. This research offers a method for growing g-C₃N₄ films, which is crucial for broadening their utility beyond catalysis and potentially paving the way for future applications in optoelectronic devices and beyond.

Abstract Image

查看原文本刊更多论文

求助全文

约1分钟内获得全文求助全文

来源期刊

ACS Materials Letters MATERIALS SCIENCE, MULTIDISCIPLINARY-

CiteScore

14.60

自引率

3.50%

发文量

261

期刊介绍： ACS Materials Letters is a journal that publishes high-quality and urgent papers at the forefront of fundamental and applied research in the field of materials science. It aims to bridge the gap between materials and other disciplines such as chemistry, engineering, and biology. The journal encourages multidisciplinary and innovative research that addresses global challenges. Papers submitted to ACS Materials Letters should clearly demonstrate the need for rapid disclosure of key results. The journal is interested in various areas including the design, synthesis, characterization, and evaluation of emerging materials, understanding the relationships between structure, property, and performance, as well as developing materials for applications in energy, environment, biomedical, electronics, and catalysis. The journal has a 2-year impact factor of 11.4 and is dedicated to publishing transformative materials research with fast processing times. The editors and staff of ACS Materials Letters actively participate in major scientific conferences and engage closely with readers and authors. The journal also maintains an active presence on social media to provide authors with greater visibility.