Pingmei Yin , Renlong Dai , Lei Yang , Zhengyu Liu , Xubing Wei , Yifei Xu , Wangjun Cheng , Yaoning Sun , Guangan Zhang
{"title":"Exploring the friction mechanism of a-C:H:Si:O film under water-lubricated condition","authors":"Pingmei Yin , Renlong Dai , Lei Yang , Zhengyu Liu , Xubing Wei , Yifei Xu , Wangjun Cheng , Yaoning Sun , Guangan Zhang","doi":"10.1016/j.diamond.2025.112162","DOIUrl":null,"url":null,"abstract":"<div><div>In this study, comparing friction behaviors of a-C:H:Si:O films under dry-friction and water-lubricated conditions revealed key findings. Under water-lubricated condition, the wear rate of a-C:H:Si:O films exhibit a trend of initial decrease followed by an increase with increasing Si content. Specifically, at a Si content of 7.8 at.%, the wear rate of the films drops significantly from 13.0 × 10<sup>−8</sup> mm<sup>3</sup>/Nm under dry-friction to 1.40 × 10<sup>−8</sup> mm<sup>3</sup>/Nm under water-lubricated condition, demonstrating excellent wear resistance. However, when the Si content increases to 14.1 at.%, the wear rate gradually rises to 17.10 × 10<sup>−8</sup> mm<sup>3</sup>/Nm. This increase is primarily attributed to intensified tribo-chemical reactions induced by excessively high Si content, coupled with the mobility of water facilitating the migration of wear debris to the friction interface, ultimately leading to abrasive wear. This finding not only reveals the influence of Si content on the wear resistance of the films but also provides an important basis for optimizing tribological performance under water-lubricated condition.</div></div>","PeriodicalId":11266,"journal":{"name":"Diamond and Related Materials","volume":"154 ","pages":"Article 112162"},"PeriodicalIF":4.3000,"publicationDate":"2025-02-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Diamond and Related Materials","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0925963525002195","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0
Abstract
In this study, comparing friction behaviors of a-C:H:Si:O films under dry-friction and water-lubricated conditions revealed key findings. Under water-lubricated condition, the wear rate of a-C:H:Si:O films exhibit a trend of initial decrease followed by an increase with increasing Si content. Specifically, at a Si content of 7.8 at.%, the wear rate of the films drops significantly from 13.0 × 10−8 mm3/Nm under dry-friction to 1.40 × 10−8 mm3/Nm under water-lubricated condition, demonstrating excellent wear resistance. However, when the Si content increases to 14.1 at.%, the wear rate gradually rises to 17.10 × 10−8 mm3/Nm. This increase is primarily attributed to intensified tribo-chemical reactions induced by excessively high Si content, coupled with the mobility of water facilitating the migration of wear debris to the friction interface, ultimately leading to abrasive wear. This finding not only reveals the influence of Si content on the wear resistance of the films but also provides an important basis for optimizing tribological performance under water-lubricated condition.
期刊介绍:
DRM is a leading international journal that publishes new fundamental and applied research on all forms of diamond, the integration of diamond with other advanced materials and development of technologies exploiting diamond. The synthesis, characterization and processing of single crystal diamond, polycrystalline films, nanodiamond powders and heterostructures with other advanced materials are encouraged topics for technical and review articles. In addition to diamond, the journal publishes manuscripts on the synthesis, characterization and application of other related materials including diamond-like carbons, carbon nanotubes, graphene, and boron and carbon nitrides. Articles are sought on the chemical functionalization of diamond and related materials as well as their use in electrochemistry, energy storage and conversion, chemical and biological sensing, imaging, thermal management, photonic and quantum applications, electron emission and electronic devices.
The International Conference on Diamond and Carbon Materials has evolved into the largest and most well attended forum in the field of diamond, providing a forum to showcase the latest results in the science and technology of diamond and other carbon materials such as carbon nanotubes, graphene, and diamond-like carbon. Run annually in association with Diamond and Related Materials the conference provides junior and established researchers the opportunity to exchange the latest results ranging from fundamental physical and chemical concepts to applied research focusing on the next generation carbon-based devices.