Low-Power and High-Gain Organic Transistors Achieved Through an Ideal Contact Approaching the Schottky–Mott Limit

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Jialin Shi, Yujian Zhang, Wei Deng*, Xiaobin Ren, Jianchao Qi, Fangming Sheng, Rui Pan, Jiansheng Jie* and Xiujuan Zhang*, 
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Abstract

The advancement of flexible electronics necessitates low-power and high-gain organic transistors endowed with the capability to amplify feeble signals, meeting the demands of signal processing and transmission. Despite a myriad of endeavors, the intrinsic gain (Ai) of organic transistors at low supply voltage is conditioned by extrinsic losses attributable to imperfections at the electrical contact. Here, we push the metal–organic semiconductor contact close to the ideal Schottky–Mott model through a blade-coating-induced meniscus extension method, which allows the growth of organic single-crystalline films on multiple and uneven electrode heterointerfaces. Using this approach, our transistor manifests an impeccable gate electrostatic tunability with an ideal subthreshold swing (SS) of 59.6 mV dec–1 and a low average SS of 84.2 mV dec–1 over six decades of current, yielding a high Ai of 1.35 × 105, which is comparable with the reported champion organic thin-film transistors. As a result, an amplifier based on the transistors can operate normally at an extremely low dynamic power consumption of 33.2 pW and reach an ultrahigh voltage gain of 1590 V/V at a low voltage of 5 V. Our study promises to usher in low-power organic electronics reaching the bounds of physical performance.

Abstract Image

通过接近肖特基-莫特极限的理想接触实现的低功耗高增益有机晶体管
柔性电子技术的发展需要具有微弱信号放大能力的低功耗高增益有机晶体管,以满足信号处理和传输的要求。尽管进行了无数的努力,在低电源电压下,有机晶体管的固有增益(Ai)是由电接触处的缺陷引起的外在损耗所决定的。在这里,我们通过叶片涂层诱导的半月板扩展方法将金属-有机半导体接触点推向理想的Schottky-Mott模型,这使得有机单晶薄膜能够在多个不均匀的电极异质界面上生长。使用这种方法,我们的晶体管表现出无可挑剔的栅极静电可调性,理想的亚阈值摆幅(SS)为59.6 mV dec1,在60年的电流下平均SS为84.2 mV dec1,产生1.35 × 105的高Ai,与报道的顶级有机薄膜晶体管相当。因此,基于晶体管的放大器可以在33.2 pW的极低动态功耗下正常工作,并在5 V的低电压下达到1590 V/V的超高电压增益。我们的研究有望引领低功耗有机电子器件达到物理性能的极限。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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