{"title":"Low-Power and High-Gain Organic Transistors Achieved Through an Ideal Contact Approaching the Schottky–Mott Limit","authors":"Jialin Shi, Yujian Zhang, Wei Deng*, Xiaobin Ren, Jianchao Qi, Fangming Sheng, Rui Pan, Jiansheng Jie* and Xiujuan Zhang*, ","doi":"10.1021/acsami.4c1758110.1021/acsami.4c17581","DOIUrl":null,"url":null,"abstract":"<p >The advancement of flexible electronics necessitates low-power and high-gain organic transistors endowed with the capability to amplify feeble signals, meeting the demands of signal processing and transmission. Despite a myriad of endeavors, the intrinsic gain (<i>A</i><sub>i</sub>) of organic transistors at low supply voltage is conditioned by extrinsic losses attributable to imperfections at the electrical contact. Here, we push the metal–organic semiconductor contact close to the ideal Schottky–Mott model through a blade-coating-induced meniscus extension method, which allows the growth of organic single-crystalline films on multiple and uneven electrode heterointerfaces. Using this approach, our transistor manifests an impeccable gate electrostatic tunability with an ideal subthreshold swing (<i>SS</i>) of 59.6 mV dec<sup>–1</sup> and a low average <i>SS</i> of 84.2 mV dec<sup>–1</sup> over six decades of current, yielding a high <i>A</i><sub>i</sub> of 1.35 × 10<sup>5</sup>, which is comparable with the reported champion organic thin-film transistors. As a result, an amplifier based on the transistors can operate normally at an extremely low dynamic power consumption of 33.2 pW and reach an ultrahigh voltage gain of 1590 V/V at a low voltage of 5 V. Our study promises to usher in low-power organic electronics reaching the bounds of physical performance.</p>","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"17 8","pages":"12477–12487 12477–12487"},"PeriodicalIF":8.2000,"publicationDate":"2025-02-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Materials & Interfaces","FirstCategoryId":"88","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsami.4c17581","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
The advancement of flexible electronics necessitates low-power and high-gain organic transistors endowed with the capability to amplify feeble signals, meeting the demands of signal processing and transmission. Despite a myriad of endeavors, the intrinsic gain (Ai) of organic transistors at low supply voltage is conditioned by extrinsic losses attributable to imperfections at the electrical contact. Here, we push the metal–organic semiconductor contact close to the ideal Schottky–Mott model through a blade-coating-induced meniscus extension method, which allows the growth of organic single-crystalline films on multiple and uneven electrode heterointerfaces. Using this approach, our transistor manifests an impeccable gate electrostatic tunability with an ideal subthreshold swing (SS) of 59.6 mV dec–1 and a low average SS of 84.2 mV dec–1 over six decades of current, yielding a high Ai of 1.35 × 105, which is comparable with the reported champion organic thin-film transistors. As a result, an amplifier based on the transistors can operate normally at an extremely low dynamic power consumption of 33.2 pW and reach an ultrahigh voltage gain of 1590 V/V at a low voltage of 5 V. Our study promises to usher in low-power organic electronics reaching the bounds of physical performance.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.