Prospects and challenges of thin film coating materials and their applications

IF 4.4 3区化学 Q1 CHEMISTRY, INORGANIC & NUCLEAR

Inorganic Chemistry Communications Pub Date : 2025-02-18 DOI:10.1016/j.inoche.2025.114117

Md. Abdullah , Md. Mobashir Hosain , Md Mahadi Hassan Parvez , Md Samiul Haque Motayed

{"title":"Prospects and challenges of thin film coating materials and their applications","authors":"Md. Abdullah , Md. Mobashir Hosain , Md Mahadi Hassan Parvez , Md Samiul Haque Motayed","doi":"10.1016/j.inoche.2025.114117","DOIUrl":null,"url":null,"abstract":"<div><div>Thin film coating materials have become integral to various industries due to their unique physical, chemical, and mechanical properties. This paper provides a comprehensive overview of thin film materials, deposition techniques, applications, and challenges while exploring future prospects. The materials discussed include metallic coatings such as gold, silver, aluminum, and titanium nitride (TiN), valued for their electrical conductivity, reflectivity, and hardness. Oxide materials like silicon dioxide, titanium dioxide, and aluminum oxide play critical roles in electronics, solar cells, and protective applications due to their dielectric properties and wear resistance. Polymeric coatings, including PTFE, PET, and PVDF, offer non-stick, barrier, and weather-resistant capabilities. Composite and hybrid materials, particularly nanocomposites and graphene-based systems, are highlighted for their multifunctionality and potential in advanced electronics and energy storage. Key deposition techniques such as Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), Atomic Layer Deposition (ALD), and the sol–gel process are outlined for their precision and adaptability. Applications range from electronics and semiconductors to optics, energy storage, biomedical devices, and protective coatings. However, challenges such as durability, scalability, environmental concerns, and costs pose significant barriers. Looking ahead, the development of nanostructured, multi-layer, and green thin films presents exciting possibilities for enhancing performance and sustainability. By addressing existing limitations and innovating in material design and deposition methods, thin film technologies are poised to drive advancements in emerging fields, including flexible electronics, renewable energy, and environmentally friendly coatings. This study underscores the critical role of thin films in modern technology and their potential for transformative impact.</div></div>","PeriodicalId":13609,"journal":{"name":"Inorganic Chemistry Communications","volume":"175 ","pages":"Article 114117"},"PeriodicalIF":4.4000,"publicationDate":"2025-02-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Inorganic Chemistry Communications","FirstCategoryId":"92","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S138770032500231X","RegionNum":3,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, INORGANIC & NUCLEAR","Score":null,"Total":0}

引用次数: 0

Abstract

Thin film coating materials have become integral to various industries due to their unique physical, chemical, and mechanical properties. This paper provides a comprehensive overview of thin film materials, deposition techniques, applications, and challenges while exploring future prospects. The materials discussed include metallic coatings such as gold, silver, aluminum, and titanium nitride (TiN), valued for their electrical conductivity, reflectivity, and hardness. Oxide materials like silicon dioxide, titanium dioxide, and aluminum oxide play critical roles in electronics, solar cells, and protective applications due to their dielectric properties and wear resistance. Polymeric coatings, including PTFE, PET, and PVDF, offer non-stick, barrier, and weather-resistant capabilities. Composite and hybrid materials, particularly nanocomposites and graphene-based systems, are highlighted for their multifunctionality and potential in advanced electronics and energy storage. Key deposition techniques such as Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), Atomic Layer Deposition (ALD), and the sol–gel process are outlined for their precision and adaptability. Applications range from electronics and semiconductors to optics, energy storage, biomedical devices, and protective coatings. However, challenges such as durability, scalability, environmental concerns, and costs pose significant barriers. Looking ahead, the development of nanostructured, multi-layer, and green thin films presents exciting possibilities for enhancing performance and sustainability. By addressing existing limitations and innovating in material design and deposition methods, thin film technologies are poised to drive advancements in emerging fields, including flexible electronics, renewable energy, and environmentally friendly coatings. This study underscores the critical role of thin films in modern technology and their potential for transformative impact.

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来源期刊

Inorganic Chemistry Communications 化学-无机化学与核化学

CiteScore

5.50

自引率

7.90%

发文量

1013

审稿时长

53 days

期刊介绍： Launched in January 1998, Inorganic Chemistry Communications is an international journal dedicated to the rapid publication of short communications in the major areas of inorganic, organometallic and supramolecular chemistry. Topics include synthetic and reaction chemistry, kinetics and mechanisms of reactions, bioinorganic chemistry, photochemistry and the use of metal and organometallic compounds in stoichiometric and catalytic synthesis or organic compounds.